The photoresist developing ability study at different contact angle and mask transmission rate
Lijun, Chen, Haichang, Zheng, Xiaolong, Wang, Lipeng, Qin, Jiawen, Chen, Pengteng, Yin
Published in 2021 China Semiconductor Technology International Conference (CSTIC) (14.03.2021)
Published in 2021 China Semiconductor Technology International Conference (CSTIC) (14.03.2021)
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Conference Proceeding
The Mechanism Study of Rounded AA Damage Defect after POLY Loop
Haichang, Zheng, Lijun, Chen, Xiaolong, Wang, Yu, Zhang, Xiaobin, Zhu, Chi, Zhang
Published in 2021 China Semiconductor Technology International Conference (CSTIC) (14.03.2021)
Published in 2021 China Semiconductor Technology International Conference (CSTIC) (14.03.2021)
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Conference Proceeding
Image Stitching Method for Stitching Product
Zhu, Xiaobin, Chen, Lijun, Zhang, Yu, Zheng, Haichang, Wang, Xiaolong
Year of Publication 25.05.2023
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Year of Publication 25.05.2023
Patent
A novel SEM image based advanced lithography process control providing quick feedback
Fan, Xuedong, Chen, Lijun, Zhu, Jun, Zheng, Haichang, Wang, Xiaolong, Ge, Yancong, Zhang, Yu, Vikram, Abhishek, Cheng, Guojie, Wang, Hui, Zhang, Qing, Liao, Wenkui
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Mask and photoetching machine
XU YANG, ZHOU SHIJUN, WANG XIAOLONG, HU JIAN, ZHENG HAICHANG, CHEN LIJUN
Year of Publication 12.04.2022
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Year of Publication 12.04.2022
Patent
First-layer wafer alignment device of photoetching machine and alignment method of first-layer wafer alignment device
ZHU XIAOBIN, ZHANG YU, ZHENG HAICHANG, FU JIAWEI, CHEN CHENG, QIN LIPENG, CHEN LIJUN
Year of Publication 17.01.2023
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Year of Publication 17.01.2023
Patent
Front auxiliary frame composed of hydraulic tube plates and with improved welding mechanism
WENG SHENGFENG, YAN CHANGSHENG, LIU LIMING, HE BIN, XU CHAOGUO, ZHENG HAICHANG, GU QILI, WANG ZHENLIAO
Year of Publication 27.06.2023
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Year of Publication 27.06.2023
Patent