The study of overlay mark in self aligned double patterning and solution
Yao, Shuxin, Dong, Xianguo, Yuan, Wei, Hu, Hongmei, Lu, Yifei, Zeng, Shaohai, Yi, Chunyan, Li, Ming, Yang, Zhengkai, Wang, Wuping, Gan, Zhifeng, Zhang, Liang, Chong, Ermin, Mao, Zhibiao, Zhang, Yu
Published in 2015 China Semiconductor Technology International Conference (01.03.2015)
Published in 2015 China Semiconductor Technology International Conference (01.03.2015)
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