Ion projection lithography below 70 nm: tool performance and resist process
Hirscher, S., Kümmel, M., Kirch, O., Domke, W.-D., Wolter, A., Käsmaier, R., Buschbeck, H., Cekan, E., Chalupka, A., Chylik, A., Eder, S., Horner, C., Löschner, H., Nowak, R., Stengl, G., Windischbauer, T., Zeininger, M.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Conference Proceeding
Resist process development for sub-100-nm ion projection lithography
Hirscher, S, Kaesmaier, R, Domke, W.-D, Wolter, A, Löschner, H, Cekan, E, Horner, C, Zeininger, M, Ochsenhirt, J
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Conference Proceeding
Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography
de Jager, P.W.H., Mertens, B., Munro, E., Cekan, E., Lammer, G., Vonach, H., Buschbeck, H., Zeininger, M., Horner, C., Löschner, H., Stengl, G., Bleeker, A.J.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Conference Proceeding
Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
Eder-Kapl, Stefan, Loeschner, Hans, Zeininger, Michalea, Fallmann, Wolfgang, Kirch, Oliver, Patsis, George P., Constantoudis, V., Gogolides, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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