Study of a Negative Threshold Voltage Shift in Positive Bias Temperature Instability and a Positive Threshold Voltage Shift the Negative Bias Temperature Instability of Yttrium-Doped HfO2 Gate Dielectrics
Sato, Motoyuki, Kamiyama, Satoshi, Matsuki, Takeo, Ishikawa, Dai, Ono, Tetsuro, Morooka, Tetsu, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru
Published in Jpn J Appl Phys (01.04.2010)
Published in Jpn J Appl Phys (01.04.2010)
Get full text
Journal Article
COPPER DIFFUSION BEHAVIOR IN SiO2/Si STRUCTURE DURING 400 C ANNEALING
Hozawa, K, Yugami, J
Published in Jpn.J.Appl.Phys ,Part 1. Vol. 43, no. 1, pp. 1-8. 2004 (01.01.2004)
Published in Jpn.J.Appl.Phys ,Part 1. Vol. 43, no. 1, pp. 1-8. 2004 (01.01.2004)
Get full text
Journal Article
The increase of the native oxide thickness on H-terminated Si surfaces by gaseous contamination in a clean room atmosphere
ITOGA, T, KOJIMA, H, YUGAMI, J, OHKURA, M
Published in Japanese Journal of Applied Physics (01.03.1997)
Published in Japanese Journal of Applied Physics (01.03.1997)
Get full text
Conference Proceeding
Journal Article
Diffusion Control Techniques for TiN Stacked Metal Gate Electrodes for p-Type Metal Insulator Semiconductor Field Effect Transistors
Sakashita, Shinsuke, Kawahara, Takaaki, Mizutani, Masaharu, Inoue, Masao, Mori, Kenichi, Yamanari, Shinichi, Higashi, Masahiko, Nishida, Yukio, Honda, Kazuhito, Murata, Naofumi, Tsuchimoto, Junichi, Yugami, Jiro, Yoshimura, Hidefumi, Yoneda, Masahiro
Published in Japanese Journal of Applied Physics (01.04.2007)
Published in Japanese Journal of Applied Physics (01.04.2007)
Get full text
Journal Article
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE SUBSTRATE PROCESSING APPARATUS AND PROGRAM
TERASAKI MASATO, YAMAKOSHI RISA, YUGAMI JIRO, HARADA KATSUYOSHI, SHIMAMOTO SATOSHI, OZAKI TAKASHI, HIROSE YOSHIRO
Year of Publication 22.06.2017
Get full text
Year of Publication 22.06.2017
Patent
FORMATION METHOD FOR MICROPATTERN, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING DEVICE, AND RECORDING MEDIUM
HIROSE, YOSHIRO, KIKUCHI, TOSHIYUKI, SHIMAMOTO, SATOSHI, KANAYAMA, KENJI, WADA, YUICHI, YUGAMI, JIRO, ASHIHARA, HIROSHI, KAMEDA, KENJI
Year of Publication 30.04.2015
Get full text
Year of Publication 30.04.2015
Patent
Tunneling acoustic microscope
TAKATA, K, YUGAMI, J, HASEGAWA, T, HOSAKA, S, HOSOKI, S, KOMODA, T
Published in Japanese Journal of Applied Physics (01.12.1989)
Published in Japanese Journal of Applied Physics (01.12.1989)
Get full text
Journal Article
Transformation of Crystalline Structure of HfO 2 by La- or Y-Oxide Capping and Annealing
Suzuki, Takayuki, Matsuki, Takeo, Morooka, Tetsu, Sato, Motoyuki, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru
Published in ECS transactions (16.04.2010)
Published in ECS transactions (16.04.2010)
Get full text
Journal Article
Study of a Negative Threshold Voltage Shift in Positive Bias Temperature Instability and a Positive Threshold Voltage Shift the Negative Bias Temperature Instability of Yttrium-Doped HfO 2 Gate Dielectrics
Sato, Motoyuki, Kamiyama, Satoshi, Matsuki, Takeo, Ishikawa, Dai, Ono, Tetsuro, Morooka, Tetsu, Yugami, Jiro, Ikeda, Kazuto, Ohji, Yuzuru
Published in Japanese Journal of Applied Physics (01.04.2010)
Published in Japanese Journal of Applied Physics (01.04.2010)
Get full text
Journal Article