Study of De-protection Reactions for Chemically Amplified Resists
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Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Approach for High-resolution of Chemically Amplified Resists Using Rate Editor Software
Sekiguchi, Atsushi, Sensu, Yoshihisa, Miyake, Yasuhiro
Published in Japanese Journal of Applied Physics (01.01.2003)
Published in Japanese Journal of Applied Physics (01.01.2003)
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Columnar laminar flow generation device and method for generating columnar laminar flows
Ito, Takahiro, Khumpuang, Sommawan, Okuda, Shuuji, Hara, Shiro, Sensu, Yoshihisa, Takeuchi, Sho
Year of Publication 14.05.2019
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Year of Publication 14.05.2019
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COLUMNAR LAMINAR FLOW GENERATION DEVICE AND METHOD FOR GENERATING COLUMNAR LAMINAR FLOWS
TAKEUCHI Sho, ITO Takahiro, HARA Shiro, SENSU Yoshihisa, OKUDA Shuuji, KHUMPUANG Sommawan
Year of Publication 16.03.2017
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Year of Publication 16.03.2017
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METHOD OF FORECASTING FINISHED SHAPE OF PHOTORESIST AND DEVICE THEREFOR
TANI YOSHIYUKI, SASAKO MASARU, SEKIGUCHI ATSUSHI, SENSU YOSHIHISA, MINAMI YOICHI, YAMASHITA KAZUHIRO
Year of Publication 22.04.1994
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Year of Publication 22.04.1994
Patent