Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels
Yim, Jihong, Ylivaara, Oili M. E, Ylilammi, Markku, Korpelainen, Virpi, Haimi, Eero, Verkama, Emma, Utriainen, Mikko, Puurunen, Riikka L
Published in Physical chemistry chemical physics : PCCP (21.10.2020)
Published in Physical chemistry chemical physics : PCCP (21.10.2020)
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Journal Article
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara, Oili M.E., Liu, Xuwen, Kilpi, Lauri, Lyytinen, Jussi, Schneider, Dieter, Laitinen, Mikko, Julin, Jaakko, Ali, Saima, Sintonen, Sakari, Berdova, Maria, Haimi, Eero, Sajavaara, Timo, Ronkainen, Helena, Lipsanen, Harri, Koskinen, Jari, Hannula, Simo-Pekka, Puurunen, Riikka L.
Published in Thin solid films (03.02.2014)
Published in Thin solid films (03.02.2014)
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Journal Article
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Putkonen, Matti, Bosund, Markus, Ylivaara, Oili M.E., Puurunen, Riikka L., Kilpi, Lauri, Ronkainen, Helena, Sintonen, Sakari, Ali, Saima, Lipsanen, Harri, Liu, Xuwen, Haimi, Eero, Hannula, Simo-Pekka, Sajavaara, Timo, Buchanan, Iain, Karwacki, Eugene, Vähä-Nissi, Mika
Published in Thin solid films (02.05.2014)
Published in Thin solid films (02.05.2014)
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Journal Article
Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
Zhu, Zhen, Merdes, Saoussen, Ylivaara, Oili M. E., Mizohata, Kenichiro, Heikkilä, Mikko J., Savin, Hele
Published in Physica status solidi. A, Applications and materials science (01.04.2020)
Published in Physica status solidi. A, Applications and materials science (01.04.2020)
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Journal Article
Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition
Ylivaara, Oili M.E., Langner, Andreas, Liu, Xuwen, Schneider, Dieter, Julin, Jaakko, Arstila, Kai, Sintonen, Sakari, Ali, Saima, Lipsanen, Harri, Sajavaara, Timo, Hannula, Simo-Pekka, Puurunen, Riikka L.
Published in Thin solid films (31.08.2021)
Published in Thin solid films (31.08.2021)
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Journal Article
Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition
Ali, Saima, Juntunen, Taneli, Sintonen, Sakari, Ylivaara, Oili M E, Puurunen, Riikka L, Lipsanen, Harri, Tittonen, Ilkka, Hannula, Simo-Pekka
Published in Nanotechnology (04.11.2016)
Published in Nanotechnology (04.11.2016)
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Journal Article
Intercalation of Lithium Ions from Gaseous Precursors into β‑MnO2 Thin Films Deposited by Atomic Layer Deposition
Nieminen, Heta-Elisa, Miikkulainen, Ville, Settipani, Daniel, Simonelli, Laura, Hönicke, Philipp, Zech, Claudia, Kayser, Yves, Beckhoff, Burkhard, Honkanen, Ari-Pekka, Heikkilä, Mikko J, Mizohata, Kenichiro, Meinander, Kristoffer, Ylivaara, Oili M.E, Huotari, Simo, Ritala, Mikko
Published in Journal of physical chemistry. C (27.06.2019)
Published in Journal of physical chemistry. C (27.06.2019)
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Journal Article
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
Ylivaara, Oili M. E., Langner, Andreas, Ek, Satu, Malm, Jari, Julin, Jaakko, Laitinen, Mikko, Ali, Saima, Sintonen, Sakari, Lipsanen, Harri, Sajavaara, Timo, Puurunen, Riikka L.
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.12.2022)
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.12.2022)
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Journal Article
Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Boyadjiev, Stefan, Cameron, David C., Chen, Rong, Chubarov, Mikhail, Cremers, Veronique, Devi, Anjana, Drozd, Viktor, Elnikova, Liliya, Gottardi, Gloria, Grigoras, Kestutis, Hausmann, Dennis M., Hwang, Cheol Seong, Jen, Shih-Hui, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Kim, Do Han, Klibanov, Lev, Koshtyal, Yury, Krause, A. Outi I., Kuhs, Jakob, Kärkkänen, Irina, Kääriäinen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Łapicki, Adam A., Leskelä, Markku, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Mennad, Abdelkader, Militzer, Christian, Molarius, Jyrki, Norek, Małgorzata, Özgit-Akgün, Çağla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Rampelberg, Geert, Ras, Robin H. A., Rauwel, Erwan, Roozeboom, Fred, Sajavaara, Timo, Salami, Hossein, Savin, Hele, Schneider, Nathanaelle, Seidel, Thomas E., Sundqvist, Jonas, Suyatin, Dmitry B., Törndahl, Tobias, van Ommen, J. Ruud, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.01.2017)
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.01.2017)
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Book Review
Microelectrode Array With Transparent ALD TiN Electrodes
Ryynänen, Tomi, Pelkonen, Anssi, Grigoras, Kestutis, Ylivaara, Oili M E, Hyvärinen, Tanja, Ahopelto, Jouni, Prunnila, Mika, Narkilahti, Susanna, Lekkala, Jukka
Published in Frontiers in neuroscience (22.03.2019)
Published in Frontiers in neuroscience (22.03.2019)
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Journal Article
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO 2 Using Carbon Dioxide
Zhu, Zhen, Sippola, Perttu, Ylivaara, Oili M E, Modanese, Chiara, Di Sabatino, Marisa, Mizohata, Kenichiro, Merdes, Saoussen, Lipsanen, Harri, Savin, Hele
Published in Nanoscale research letters (12.02.2019)
Published in Nanoscale research letters (12.02.2019)
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Journal Article
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
Zhu, Zhen, Sippola, Perttu, Ylivaara, Oili M. E., Modanese, Chiara, Di Sabatino, Marisa, Mizohata, Kenichiro, Merdes, Saoussen, Lipsanen, Harri, Savin, Hele
Published in Nanoscale research letters (12.02.2019)
Published in Nanoscale research letters (12.02.2019)
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Journal Article
Nanotribological, nanomechanical and interfacial characterization of atomic layer deposited TiO2 on a silicon substrate
Lyytinen, Jussi, Liu, Xuwen, Ylivaara, Oili M.E., Sintonen, Sakari, Iyer, Ajai, Ali, Saima, Julin, Jaakko, Lipsanen, Harri, Sajavaara, Timo, Puurunen, Riikka L., Koskinen, Jari
Published in Wear (15.11.2015)
Published in Wear (15.11.2015)
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Journal Article
Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
Zhu, Zhen, Merdes, Saoussen, Ylivaara, Oili M. E., Mizohata, Kenichiro, Heikkilä, Mikko J., Savin, Hele
Published in Physica status solidi. A, Applications and materials science (01.04.2020)
Published in Physica status solidi. A, Applications and materials science (01.04.2020)
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Journal Article
Intercalation of Lithium Ions from Gaseous Precursors into β-MnO 2 Thin Films Deposited by Atomic Layer Deposition
Nieminen, Heta-Elisa, Miikkulainen, Ville, Settipani, Daniel, Simonelli, Laura, Hönicke, Philipp, Zech, Claudia, Kayser, Yves, Beckhoff, Burkhard, Honkanen, Ari-Pekka, Heikkilä, Mikko J., Mizohata, Kenichiro, Meinander, Kristoffer, Ylivaara, Oili M.E., Huotari, Simo, Ritala, Mikko
Published in Journal of physical chemistry. C (27.06.2019)
Published in Journal of physical chemistry. C (27.06.2019)
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Journal Article
Thermal conductivity of amorphous Al 2 O 3 /TiO 2 nanolaminates deposited by atomic layer deposition
Ali, Saima, Juntunen, Taneli, Sintonen, Sakari, Ylivaara, Oili M E, Puurunen, Riikka L, Lipsanen, Harri, Tittonen, Ilkka, Hannula, Simo-Pekka
Published in Nanotechnology (04.11.2016)
Published in Nanotechnology (04.11.2016)
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Journal Article
(Semi-)transparent ALD TiN microelectrodes
Ryynänen, Tomi, Pelkonen, Anssi, Grigoras, Kestutis, Ylivaara, Oili, Ahopelto, Jouni, Narkilahti, Susanna, Lekkala, Jukka
Published in Frontiers in cellular neuroscience (2018)
Published in Frontiers in cellular neuroscience (2018)
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Journal Article
Nanotribological, nanomechanical and interfacial characterization of atomic layer deposited TiO sub(2) on a silicon substrate
Lyytinen, Jussi, Liu, Xuwen, Ylivaara, Oili ME, Sintonen, Sakari, Iyer, Ajai, Ali, Saima, Julin, Jaakko, Lipsanen, Harri, Sajavaara, Timo, Puurunen, Riikka L, Koskinen, Jari
Published in Wear (15.11.2015)
Published in Wear (15.11.2015)
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Journal Article