Tailoring indium oxide film characteristics through oxygen reactants in atomic layer deposition with highly reactive liquid precursor
Ryu, Seong-Hwan, Hong, TaeHyun, Choi, Su-Hwan, Yeom, Kyuhyun, Won Ryu, Dae, Hyeon Seok, Jang, Park, Jin-Seong
Published in Applied surface science (15.08.2024)
Published in Applied surface science (15.08.2024)
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