Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-Molecular Precursors for Efficient and Predictive p‑Doping of Silicon
Mathey, Laurent, Alphazan, Thibault, Valla, Maxence, Veyre, Laurent, Fontaine, Hervé, Enyedi, Virginie, Yckache, Karim, Danielou, Marianne, Kerdiles, Sébastien, Guerrero, Jean, Barnes, Jean-Paul, Veillerot, Marc, Chevalier, Nicolas, Mariolle, Denis, Bertin, François, Durand, Corentin, Berthe, Maxime, Dendooven, Jolien, Martin, François, Thieuleux, Chloé, Grandidier, Bruno, Copéret, Christophe
Published in Journal of physical chemistry. C (18.06.2015)
Published in Journal of physical chemistry. C (18.06.2015)
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Journal Article
Low and High Temperature Boron and Phosphorous Doping of Si for Junctions and MEMS Purposes
Gonzatti, Frederic, Hartmann, Jean-Michel, Yckache, Karim
Published in ECS transactions (03.10.2008)
Published in ECS transactions (03.10.2008)
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Journal Article
Effect of Nitridation for High-K Layers by ALCVDTM in Order to Decrease the Trapping in Non Volatile Memories
Grampeix, Helen, Colonna, Jean-Philippe, Molas, Gabriel, Bocquet, Marc, Martin, François, Rochat, Névine, Martinez, Eugénie, Licitra, Christophe, Veyron, Thomas, Papon, Anne-Marie, Gely, Marc, Yckache, Karim
Published in ECS transactions (28.09.2007)
Published in ECS transactions (28.09.2007)
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Journal Article
Deterministic Placement of Doping Atoms on Silanol Surfaces
Mathey, Laurent, Veyre, Laurent, Fontaine, Hervé, Enyedi, Virginie, Yckache, Karim, Guerrero, Jean, Martin, François, Barnes, Jean-Paul, Bertin, François, Thieuleux, Chloé, Copéret, Christophe
Published in Meeting abstracts (Electrochemical Society) (04.06.2012)
Published in Meeting abstracts (Electrochemical Society) (04.06.2012)
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Journal Article
Integration of a plasma doping PULSION® process into a fully depleted SOI transistor flow chart
Duchaine, J., Gonzatti, F., Torregrosa, F., Etienne, H., Felch, S., Milesi, F., Yckache, K., Spiegel, Y., Claverie, A.
Published in 11th International Workshop on Junction Technology (IWJT) (01.06.2011)
Published in 11th International Workshop on Junction Technology (IWJT) (01.06.2011)
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