Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas
Jeon, Min Hwan, Kim, Hoe Jun, Yang, Kyung Che, Kang, Se Koo, Kim, Kyong Nam, Yeom, Geun Young
Published in Jpn J Appl Phys (25.05.2013)
Published in Jpn J Appl Phys (25.05.2013)
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Journal Article
Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH 3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas
Jeon, Min Hwan, Kim, Hoe Jun, Yang, Kyung Che, Kang, Se Koo, Kim, Kyong Nam, Yeom, Geun Young
Published in Japanese Journal of Applied Physics (01.05.2013)
Published in Japanese Journal of Applied Physics (01.05.2013)
Get full text
Journal Article
Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH sub(3) Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas
Jeon, Min Hwan, Kim, Hoe Jun, Yang, Kyung Che, Kang, Se Koo, Kim, Kyong Nam, Yeom, Geun Young
Published in Japanese Journal of Applied Physics (01.05.2013)
Published in Japanese Journal of Applied Physics (01.05.2013)
Get full text
Journal Article