Search Results - "Yanagisawa, Hideto" :: K.UTB vyhledávací portál

Dielectric Properties of Zr--Al Anodized Thin Film Capacitors Prepared Using Al-Doped Zr Alloy Films

by Kimizaki, Hidefumi, Shinkai, Satoko, Sasaki, Katsutaka, Yanagisawa, Hideto, Yamane, Misao, Abe, Yoshio
Published in Japanese Journal of Applied Physics (01.10.2010)

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Preparation of Oxygen-Containing Pt and Pt Oxide Thin Films by Reactive Sputtering and Their Characterization

by Yoshio Abe, Yoshio Abe, Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki
Published in Japanese Journal of Applied Physics (01.08.1998)

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Crystal Orientation of Epitaxial α-Ta(110) Thin Films Grown on Si(100) and Si(111) Substrates by Sputtering

by Kudo, Masahiro, Shinkai, Satoko, Yanagisawa, Hideto, Sasaki, Katsutaka, Abe, Yoshio
Published in Japanese Journal of Applied Physics (01.07.2008)

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Single-Oriented Growth of (111) Cu Film on Thin ZrN/Zr Bilayered Film for ULSI Metallization

by Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki, Hidekazu Miyake, Hidekazu Miyake, Yoshio Abe, Yoshio Abe
Published in Japanese Journal of Applied Physics (01.10.2000)

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Epitaxial Growth of (0001)Ru Thin Films on (111)ZrN/(111)Si by Low-Temperature Process and Their Surface Morphologies

by Sakurai, Junpei, Sasaki, Katsutaka, Yanagisawa, Hideto, Shinkai, Satoko, Abe, Yoshio
Published in Japanese Journal of Applied Physics (01.03.2008)

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Epitaxial Growth of (001)ZrN Thin Films on (001)Si by Low Temperature Process

by Yanagisawa, Hideto, Shinkai, Satoko, Sasaki, Katsutaka, Abe, Yoshio, Sakai, Akira, Zaima, Shigeaki
Published in Japanese Journal of Applied Physics (01.01.2005)

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Study on Preparation Conditions of High-Quality ZrN Thin Films Using a Low-Temperature Process

by Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki, Yoshio Abe, Yoshio Abe, Midori Kawamura, Midori Kawamura, Satoko Shinkai, Satoko Shinkai
Published in Japanese Journal of Applied Physics (01.10.1998)

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Study on Preparation Conditions of Single-Oriented (002) Zr Thin Films on n-(001) Si

by Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki, Hidekazu Miyake, Hidekazu Miyake, Yoshio Abe, Yoshio Abe
Published in Japanese Journal of Applied Physics (01.07.2000)

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A Study on the Preparation Conditions of Single Oriented (002) Hf Film on n-(001) Si

by Satoko Shinkai, Satoko Shinkai, Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki, Yoshio Abe, Yoshio Abe
Published in Japanese Journal of Applied Physics (01.02.1998)

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ELECTRICAL PROPERTIES OF HfO2 THIN INSULATING FILM PREPARED BY ANODIC OXIDATION

by Yanagisawa, H, Kamijyo, M, Shinkai, S, Sasaki, K, Abe, Y, Yamane, M
Published in Jpn.J.Appl.Phys ,Part 1. Vol. 41, no. 8, pp. 5284-5287. 2002 (2002)

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Realization of Cu(111) Single-Oriented State on SiO 2 by Annealing Cu–Zr Film and the Thermal Stability of Cu–Zr/ZrN/Zr/Si Contact System

by Katsutaka Sasaki, Katsutaka Sasaki, Hidekazu Miyake, Hidekazu Miyake, Satoko Shinkai, Satoko Shinkai, Yoshio Abe, Yoshio Abe, Hideto Yanagisawa, Hideto Yanagisawa
Published in Japanese Journal of Applied Physics (01.07.2001)

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Preparation of a Contact System with a Single-Oriented (111)Al Overlayer by Interposing a Thin ZrN/Zr Bilayered Barrier Applicable to Sub-0.25-µm Design Rule

by Hidekazu Miyake, Hidekazu Miyake, Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki, Satoko Shinkai, Satoko Shinkai, Yoshio Abe, Yoshio Abe
Published in Japanese Journal of Applied Physics (01.06.2001)

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Effects of Sputtering Parameters on the Formation of Single-Oriented (002) Ti Film on Si

by Mireba, Kazuhiro, Shinkai, Satoko, Yanagisawa, Hideto, Sasaki, Katsutaka, Abe, Yoshio
Published in Japanese Journal of Applied Physics (01.01.2005)

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Realization of Sequential Epitaxial Growth of Cu/HfN Bilayered Films on (111) and (001) Si

by Shinkai, Satoko, Sasaki, Katsutaka, Yanagisawa, Hideto, Abe, Yoshio
Published in Japanese Journal of Applied Physics (2003)

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Preparation of Low-Resistivity α -Ta Thin Films on (001) Si by Conventional DC Magnetron Sputtering

by Shiojiri, Masayuki, Shinkai, Satoko, Sasaki, Katsutaka, Yanagisawa, Hideto, Abe, Yoshio
Published in Japanese Journal of Applied Physics (2003)

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Formation Process and Electrical Property of RuO 2 Thin Films Prepared by Reactive Sputtering

by Yukinao Kaga, Yukinao Kaga, Yoshio Abe, Yoshio Abe, Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki
Published in Japanese Journal of Applied Physics (01.06.1998)

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Initial Silicide Formation Process of Single Oriented (002) Hf Film on Si and Its Diffusion Barrier Property

by Satoko Shinkai, Satoko Shinkai, Katsutaka Sasaki, Katsutaka Sasaki, Yoshio Abe, Yoshio Abe, Hideto Yanagisawa, Hideto Yanagisawa
Published in Japanese Journal of Applied Physics (01.04.1998)

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Preparation of Cu 10 Zr 7 Intermetallic Compound Film and Its Application as a Diffusion Barrier in Cu/Cu 10 Zr 7 /ZrN/Si Contact System

by Ken-ichi Yoshimoto, Ken-ichi Yoshimoto, Hideto Yanagisawa, Hideto Yanagisawa, Katsutaka Sasaki, Katsutaka Sasaki
Published in Japanese Journal of Applied Physics (01.12.1997)

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