Channel Geometry Impact and Narrow Sheet Effect of Stacked Nanosheet
Yeung, Chun Wing, Zhang, Jingyun, Chao, Robin, Kwon, Ohseong, Vega, Reinaldo, Tsutsui, Gen, Miao, Xin, Zhang, Chen, Sohn, Chang-Woo, Moon, Bum Ki, Razavieh, Ali, Frougier, Julien, Greene, Andrew, Galatage, Rohit, Li, Juntao, Wang, Miaomiao, Loubet, Nicolas, Robison, Robert, Basker, Veeraraghavan, Yamashita, Tenko, Guo, Dechao
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
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Conference Proceeding
High-k metal gate fundamental learning and multi-Vt options for stacked nanosheet gate-all-around transistor
Jingyun Zhang, Ando, Takashi, Chun Wing Yeung, Miaomiao Wang, Ohseong Kwon, Galatage, Rohit, Chao, Robin, Loubet, Nicolas, Bum Ki Moon, Ruqiang Bao, Vega, Reinaldo A., Juntao Li, Chen Zhang, Zuoguang Liu, Myunggil Kang, Xin Miao, Junli Wang, Kanakasabapathy, Sivananda, Basker, Veeraraghavan S., Jagannathan, Hemanth, Yamashita, Tenko
Published in 2017 IEEE International Electron Devices Meeting (IEDM) (01.12.2017)
Published in 2017 IEEE International Electron Devices Meeting (IEDM) (01.12.2017)
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Conference Proceeding
FinFET External Resistance Analysis by Extended Shift-and-Ratio Method
Zhang, Chen, Liu, Zuoguang, Miao, Xin, Yamashita, Tenko
Published in IEEE transactions on electron devices (01.08.2018)
Published in IEEE transactions on electron devices (01.08.2018)
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Journal Article
Improved Air Spacer for Highly Scaled CMOS Technology
Cheng, Kangguo, Park, Chanro, Wu, Heng, Li, Juntao, Nguyen, Son, Zhang, Jingyun, Wang, Miaomiao, Mehta, Sanjay, Liu, Zuoguang, Conti, Richard, Loubet, Nicolas J., Frougier, Julien, Greene, Andrew, Yamashita, Tenko, Haran, Balasubramanian, Divakaruni, Rama
Published in IEEE transactions on electron devices (01.12.2020)
Published in IEEE transactions on electron devices (01.12.2020)
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Journal Article
Direct Partition Measurement of Parasitic Resistance Components in Advanced Transistor Architectures
Liu, Zuoguang, Wu, Heng, Zhang, Chen, Miao, Xin, Zhou, Huimei, Southwick, Richard, Yamashita, Tenko, Guo, Dechao
Published in 2019 Symposium on VLSI Technology (01.06.2019)
Published in 2019 Symposium on VLSI Technology (01.06.2019)
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Conference Proceeding
Bias Temperature Instability Reliability in Stacked Gate-All-Around Nanosheet Transistor
Wang, Miaomiao, Zhang, Jingyun, Zhou, Huimei, Southwick, Richard G., Kuo Chao, Robin Hsin, Miao, Xin, Basker, Veeraraghavan S., Yamashita, Tenko, Guo, Dechao, Karve, Gauri, Bu, Huiming, Stathis, James H.
Published in 2019 IEEE International Reliability Physics Symposium (IRPS) (01.03.2019)
Published in 2019 IEEE International Reliability Physics Symposium (IRPS) (01.03.2019)
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Conference Proceeding
Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact over Active Gate (COAG) for Highly Scaled CMOS Technology
Cheng, Kangguo, Park, Chanro, Wu, Heng, Li, Juntao, Nguyen, Son, Zhang, Jingyun, Wang, Miaomiao, Mehta, Sanjay, Liu, Zuoguang, Conti, Richard, Loubet, Nicolas, Frougier, Julien, Greene, Andrew, Yamashita, Tenko, Haran, Bala, Divakaruni, Rama
Published in 2020 IEEE Symposium on VLSI Technology (01.06.2020)
Published in 2020 IEEE Symposium on VLSI Technology (01.06.2020)
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Conference Proceeding
Technique for Asymmetric Source/Drain Resistance Extraction on a Single Gate Length MOSFET
Oldiges, Phil, Zhang, Chen, Miao, Xin, Kang, Myung Gil, Yamashita, Tenko
Published in 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (01.09.2018)
Published in 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (01.09.2018)
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Conference Proceeding
Sub- 10^~\Omega -cm2 n-Type Contact Resistivity for FinFET Technology
Niimi, Hiroaki, Zuoguang Liu, Gluschenkov, Oleg, Mochizuki, Shogo, Fronheiser, Jody, Juntao Li, Demarest, James, Chen Zhang, Bei Liu, Jie Yang, Raymond, Mark, Haran, Bala, Huiming Bu, Yamashita, Tenko
Published in IEEE electron device letters (01.11.2016)
Published in IEEE electron device letters (01.11.2016)
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Journal Article
Backside Power Distribution for Nanosheet Technologies Beyond 2nm
Xie, Ruilong, Hong, Wonhyuk, Zhang, Chen, Lee, Jongjin, Brew, Kevin, Johnson, Richard, Lanzillo, Nicholas, Shobha, Hosadurga, Kim, Taesun, Park, Panjae, Mochizuki, Shogo, Saraf, Iqbal, Park, Chanro, Zhuang, Lei, Osborn, Clifford, Li, Wai Kin, Liu, Feng, Sankarapandian, Muthumanickam, Yang, Chung Ju, Li, Juntao, Tierney, Lukas, Pujari, Ruturaj, Sulehria, Yasir, Song, Yuncheng, Zhou, Huimei, Wang, Miaomiao, Belyansky, Michael, Ghosh, Somnath, Zhang, Haojun, Motoyama, Koichi, Sarkar, Debarghya, Kim, Wukang, Chu, Albert, Li, Tao, Carta, Fabio, Gluschenkov, Oleg, Oh, Joongsuk, Malley, Matthew, Chu, Pinlei, Nguyen, Son, Luedders, Katherine, Lee, Joe, Khan, Shahrukh, Chowdhury, Prabudhya Roy, Huang, Huai, Shadman, Abir, Sieg, Stuart, Dechene, Daniel, Edelstein, Daniel, Arnold, John, Yamashita, Tenko, Choi, Kisik, Seo, Kang-ill, Guo, Dechao, Bu, Huiming
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
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Conference Proceeding
Pinch-Off Plasma CVD Deposition Process and Material Technology for Nano-Device Air Gap/Spacer Formation
Nguyen, Son van, Haigh, Thomas J, Cheng, Kangguo, Penny, C., Park, Chanro, Li, J., Mehta, Sanjay C, Yamashita, Tenko, Jiang, Liying, Canaperi, Don
Published in ECS transactions (09.04.2018)
Published in ECS transactions (09.04.2018)
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Journal Article
Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability
Zuoguang Liu, Gluschenkov, Oleg, Niimi, Hiroaki, Bei Liu, Juntao Li, Demarest, James, Mochizuki, Shogo, Adusumilli, Praneet, Raymond, Mark, Carr, Adra, Shaoyin Chen, Yun Wang, Jagannathan, Hemanth, Yamashita, Tenko
Published in 2017 Symposium on VLSI Technology (01.06.2017)
Published in 2017 Symposium on VLSI Technology (01.06.2017)
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Conference Proceeding