Economic analysis of waste recycle process in perhydropolysiloxazane synthesis
Yun, Huichan, Yeom, Seungjong, Yang, Dae Ryook
Published in The Korean journal of chemical engineering (01.05.2014)
Published in The Korean journal of chemical engineering (01.05.2014)
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Journal Article
HARDMASK COMPOSITION HARDMASK LAYER AND METHOD OF FORMING PATTERNS
KIM SOOHEE, KIM YOONA, HWANG WON JONG, KIM HYEJEONG, PARK HYUNGSEOK, YUN HUICHAN, JEONG SEULGI, CHAE YUNJU, LEE JAECHUL, LEE JONGHWA
Year of Publication 03.03.2023
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Year of Publication 03.03.2023
Patent
POLYMER, ORGANIC FILM COMPOSITION AND PATTERN FORMATION METHOD
KIM, Yoona, KIM, Jinhyung, PARK, Youjung, LIM, Sanghak, YUN, Huichan, JEONG, Seulgi
Year of Publication 04.07.2019
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Year of Publication 04.07.2019
Patent
COMPOSITION FOR FORMING SILICA MEMBRANE, MANUFACTURING METHOD FOR SILICA MEMBRANE, AND SILICA MEMBRANE
SIM, Sooyeon, LEE, Jiho, KIM, Yonggoog, BAE, Jin-Hee, YUN, Huichan, KWAK, Taeksoo, KOO, Yoonyoung, HWANG, Byeong Gyu, NOH, Kunbae, JANG, Junyoung, SAKONG, Jun, SEO, Jinwoo, HAN, Kwen-Woo, KIM, Jingyo
Year of Publication 18.04.2019
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Year of Publication 18.04.2019
Patent
Study on planarization performance of spin on hardmask
Yun, Huichan, Kim, Jinhyung, Kim, Yoona, Jeong, Seulgi, Lim, Sanghak, Yu, Jeong Yun
Published in 2018 China Semiconductor Technology International Conference (CSTIC) (01.03.2018)
Published in 2018 China Semiconductor Technology International Conference (CSTIC) (01.03.2018)
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Conference Proceeding
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
KIM, Hyejeong, KIM, Soohee, KIM, Yoona, HWANG, Won Jong, PARK, Hyungseok, LEE, Jonghwa, YUN, Huichan, LEE, Jaechul, JEONG, Seulgi, CHAE, Yunju
Year of Publication 30.03.2023
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Year of Publication 30.03.2023
Patent
Composition for forming silica layer, manufacturing method for silica layer, and silica layer
Seo, Jinwoo, Kim, Yonggoog, Bae, Jin-Hee, Sim, Sooyeon, Koo, Yoonyoung, Yun, Huichan, Kwak, Taeksoo, Noh, Kunbae, Sakong, Jun, Han, Kwen-Woo, Kim, Jingyo, Hwang, Byeong Gyu, Lee, Jiho, Jang, Junyoung
Year of Publication 06.12.2022
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Year of Publication 06.12.2022
Patent
COMPOSITION FOR FORMING SILICA LAYER, MANUFACTURING METHOD FOR SILICA LAYER, AND SILICA LAYER
SIM, Sooyeon, LEE, Jiho, KIM, Yonggoog, BAE, Jin-Hee, YUN, Huichan, KWAK, Taeksoo, KOO, Yoonyoung, HWANG, Byeong Gyu, NOH, Kunbae, JANG, Junyoung, SAKONG, Jun, SEO, Jinwoo, HAN, Kwen-Woo, KIM, Jingyo
Year of Publication 26.11.2020
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Year of Publication 26.11.2020
Patent
Hardmask composition, hardmask layer, and method of forming patterns
PARK, HYUNGSEOK, JEONG, SEULGI, YUN, HUICHAN, LEE, JAECHUL, KIM, SOOHEE, LEE, JONGHWA, HWANG, WON JONG, KIM, HYEJEONG, CHAE, YUNJU, KIM, YOONA
Year of Publication 21.03.2024
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Year of Publication 21.03.2024
Patent
Composition for forming silica layer, method for manufacturing silica layer and silica layer
Seo, Jinwoo, Kim, Jingyo, Bae, Jin-Hee, Yun, Huichan, Kwak, Taeksoo, Lee, Eunseon, Kim, Haneul, Jang, Junyoung, Noh, Kunbae, Kim, Woo Han, Na, Yoong Hee, Hwang, Byeonggyu
Year of Publication 23.10.2018
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Year of Publication 23.10.2018
Patent