GaN Power Transistors on Si Substrates for Switching Applications
Ikeda, Nariaki, Niiyama, Yuki, Kambayashi, Hiroshi, Sato, Yoshihiro, Nomura, Takehiko, Kato, Sadahiro, Yoshida, Seikoh
Published in Proceedings of the IEEE (01.07.2010)
Published in Proceedings of the IEEE (01.07.2010)
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Journal Article
High-Temperature Operation of AlGaN/GaN HFET With a Low on-State Resistance, High Breakdown Voltage, and Fast Switching
Nomura, Takehiko, Kambayashi, Hiroshi, Masuda, Mitsuru, Ishii, Sonomi, Ikeda, Nariaki, Lee, Jiang, Yoshida, Seikoh
Published in IEEE transactions on electron devices (01.12.2006)
Published in IEEE transactions on electron devices (01.12.2006)
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Journal Article
Normally Off n-Channel GaN MOSFETs on Si Substrates Using an SAG Technique and Ion Implantation
Kambayashi, H., Niiyama, Y., Ootomo, S., Nomura, T., Iwami, M., Satoh, Y., Kato, S., Yoshida, S.
Published in IEEE electron device letters (01.12.2007)
Published in IEEE electron device letters (01.12.2007)
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Over 55 A, 800 V high power AlGaN/GaN HFETs for power switching application
Ikeda, Nariaki, Kato, Kazuo, Kondoh, Kazuo, Kambayashi, Hiroshi, Li, Jiang, Yoshida, Seikoh
Published in Physica status solidi. A, Applications and materials science (01.06.2007)
Published in Physica status solidi. A, Applications and materials science (01.06.2007)
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Conference Proceeding
High-quality SiO2/GaN interface for enhanced operation field-effect transistor
Niiyama, Yuki, Shinagawa, Tatsuyuki, Ootomo, Shinya, Kambayashi, Hiroshi, Nomura, Takehiko, Yoshida, Seikoh
Published in Physica status solidi. A, Applications and materials science (01.06.2007)
Published in Physica status solidi. A, Applications and materials science (01.06.2007)
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Conference Proceeding
A high-power AlGaN/GaN heterojunction field-effect transistor
Yoshida, Seikoh, Ishii, Hirotatsu, Li, Jiang, Wang, Deliang, Ichikawa, Masakazu
Published in Solid-state electronics (01.03.2003)
Published in Solid-state electronics (01.03.2003)
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Over 2 A Operation at 250 °C of GaN Metal–Oxide–Semiconductor Field Effect Transistors on Sapphire Substrates
Niiyama, Yuki, Kambayashi, Hiroshi, Ootomo, Shinya, Nomura, Takehiko, Yoshida, Seikoh, Chow, Tat-sing Paul
Published in Japanese Journal of Applied Physics (01.09.2008)
Published in Japanese Journal of Applied Physics (01.09.2008)
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Journal Article
High-performance normally off FET using an AlGaN/GaN heterostructure on Si substrate
Ikeda, Nariaki, Li, Jiang, Takehara, Hironari, Wada, Takahiro, Yoshida, Seikoh
Published in Journal of crystal growth (15.02.2005)
Published in Journal of crystal growth (15.02.2005)
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Journal Article
Buffer breakdown voltage of AlGaN/GaN HFET on a 4 inch Si(111) substrate grown by MOCVD
Iwami, Masayuki, Kato, Sadahiro, Satoh, Yoshihiro, Sasaki, Hitoshi, Yoshida, Seikoh
Published in Physica status solidi. C (01.06.2007)
Published in Physica status solidi. C (01.06.2007)
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Hexagonal GaN1-xPx growth by laser-assisted metalorganic chemical vapor deposition
KIKAWA, Junjiroh, YOSHIDA, Seikoh, ITOH, Yoshiteru
Published in Journal of crystal growth (01.07.2001)
Published in Journal of crystal growth (01.07.2001)
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Conference Proceeding
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Crystal growth of nitride-rich GaNP by laser-assisted metalorganic chemical-vapor deposition
Yoshida, Seikoh, Kikawa, Junjiroh, Itoh, Yoshiteru
Published in Journal of crystal growth (01.04.2002)
Published in Journal of crystal growth (01.04.2002)
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A Fabrication of Very Low Contact Resistance AlGaN/GaN Heterojunction Field-Effect Transistor Using Selective Area Growth Technique by Gas-Source Molecular Beam Epitaxy
Yoshida, Seikoh, Wang, Delian, Ichikawa, Masakazu
Published in Japanese Journal of Applied Physics (15.07.2002)
Published in Japanese Journal of Applied Physics (15.07.2002)
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Journal Article
C-doped GaN buffer layers with high breakdown voltages for high-power operation AlGaN/GaN HFETs on 4-in Si substrates by MOVPE
Kato, Sadahiro, Satoh, Yoshihiro, Sasaki, Hitoshi, Masayuki, Iwami, Yoshida, Seikoh
Published in Journal of crystal growth (2007)
Published in Journal of crystal growth (2007)
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Conference Proceeding
Electroluminescence studies under forward and reverse bias conditions of a nitride-rich GaN1−xPx SQW structure LED grown by laser-assisted metal-organic chemical vapor deposition
Kikawa, Junjiroh, Yoshida, Seikoh, Itoh, Yoshiteru
Published in Solid-state electronics (01.03.2003)
Published in Solid-state electronics (01.03.2003)
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In situ mass spectrometric analysis of surface chemistry in MOMBE growth
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