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Year of Publication 18.05.2006
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Resist composition comprising photosensitive polymer having lactone in its backbone
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Year of Publication 16.05.2006
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Year of Publication 16.05.2006
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A 3.3 V 10 bit current-mode folding and interpolating CMOS A/D converter using an arithmetic functionality
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Published in Proceedings of the 43rd IEEE Midwest Symposium on Circuits and Systems (Cat.No.CH37144) (2000)
Published in Proceedings of the 43rd IEEE Midwest Symposium on Circuits and Systems (Cat.No.CH37144) (2000)
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Conference Proceeding
Resist composition comprising photosensitive polymer having lactone in its backbone
LEE SOOK, LEE SI-HYEUNG, JUNG DONG-WON, CHOI SANG-JUN, KIM HYUN-WOO, YOON KWANG-SUB, WOO SANG-GYUN
Year of Publication 10.07.2007
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Year of Publication 10.07.2007
Patent
Resist composition comprising photosensitive polymer having lactone in its backbone
JUNG, DONG-WON, KIM, HYUN-WOO, LEE, SI-HYEUNG, YOON, KWANG-SUB, LEE, SOOK
Year of Publication 21.06.2003
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Year of Publication 21.06.2003
Patent
THINNER COMPOSITION AND METHOD OF REMOVING PHOTORESIST USING THE SAME
PARK SANG-KYU, YOUN YEU-YOUNG, CHON SANG-MUN, KIM DAE-JOUNG, AHN SEUNG-HYUN, CHOI BAIK-SOON, KIM JAE-HO, YI SHI-YONG, BAE EUN-MI, YOON KWANG-SUB, KIM KYOUNG-MI
Year of Publication 04.09.2008
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Year of Publication 04.09.2008
Patent
Thinner composition and method of removing photoresist using the same
PARK SANG-KYU, YOUN YEU-YOUNG, CHON SANG-MUN, KIM DAE-JOUNG, AHN SEUNG-HYUN, CHOI BAIK-SOON, KIM JAE-HO, YI SHI-YONG, BAE EUN-MI, YOON KWANG-SUB, KIM KYOUNG-MI
Year of Publication 17.06.2008
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Year of Publication 17.06.2008
Patent
Thinner composition and method of removing photoresist using the same
Ahn, Seung-Hyun, Bae, Eun-Mi, Choi, Baik-Soon, Chon, Sang-Mun, Kim, Dae-Joung, Yoon, Kwang-Sub, Park, Sang-Kyu, Kim, Jae-Ho, Yi, Shi-Yong, Kim, Kyoung-Mi, Youn, Yeu-Young
Year of Publication 17.06.2008
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Year of Publication 17.06.2008
Patent
Resist composition comprising photosensitive polymer having lactone in its backbone
LEE SOOK, LEE SI-HYEUNG, JUNG DONG-WON, CHOI SANG-JUN, KIM HYUN-WOO, YOON KWANG-SUB, WOO SANG-GYUN
Year of Publication 16.05.2006
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Year of Publication 16.05.2006
Patent
Resist composition comprising photosensitive polymer having lactone in its backbone
Yoon, Kwang-Sub, Jung, Dong-Won, Lee, Si-Hyeung, Kim, Hyun-Woo, Lee, Sook, Woo, Sang-Gyun, Choi, Sang-Jun
Year of Publication 29.01.2004
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Year of Publication 29.01.2004
Patent