ANTISTATIC BLOCK COPOLYMER PRESSURE SENSITIVE ADHESIVES AND ARTICLES
JOSEPH EUGENE G, BHARTI VIVEK, XIA JIANHUI, EVERAERTS ALBERT I, PURGETT MARK D, TSE KIU YUEN, SATRIJO ANDREW, YOON, WAN SHIK
Year of Publication 16.11.2015
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Year of Publication 16.11.2015
Patent
ANTISTATIC BLOCK COPOLYMER PRESSURE SENSITIVE ADHESIVES AND ARTICLES
JOSEPH EUGENE G, BHARTI VIVEK, XIA JIANHUI, EVERAERTS ALBERT I, PURGETT MARK D, TSE KIU YUEN, SATRIJO ANDREW, YOON, WAN SHIK
Year of Publication 25.01.2011
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Year of Publication 25.01.2011
Patent
ANTISTATIC OPTICALLY CLEAR PRESSURE SENSITIVE ADHESIVE
KLUN THOMAS P, XIA JIANHUI, EVERAERTS ALBERT I, YOON, WAN SHIK, LAMANNA WILLIAM M, ZHU DONG WEI
Year of Publication 12.02.2010
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Year of Publication 12.02.2010
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Antistatic optically clear pressure sensitive adhesive
YOON, WAN-SHIK, ZHU, DONG-WEI, XIA, JIAN-HUI, EVERAERTS, ALBERT IVO, KLUN, THOMAS PAUL, LAMANNA, WILLIAM MARIO
Year of Publication 01.03.2009
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Year of Publication 01.03.2009
Patent