Application of N2/Ar inductively coupled plasma to the photoresist ashing for low-k dielectrics
HYOUN WOO KIM, JU HYUN MYUNG, PARK, Se-Geun, LEE, Jae-Gab, NAM HO KIM, YOO, Chung-Gon, KEE WON SUH, SUNG KYEONG KIM, CHOI, Dae-Kyu, CHUNG, Chin-Wook, KANG, Chang-Jin, WAN JAE PARK
Published in Journal of materials science (01.07.2005)
Published in Journal of materials science (01.07.2005)
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Journal Article
Photoresist ashing in nitrogen gas using ferrite core inductively coupled plasmas
Kim, Hyoun Woo, Myung, Ju Hyun, Kim, Nam Ho, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Yoo, Chung-Gon, Choi, Dae-Kyu
Published in Vacuum (14.10.2005)
Published in Vacuum (14.10.2005)
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Journal Article
Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas
HYOUN WOO KIM, JONG WOO LEE, JOO, Junghoon, CHIN WOOK CHUNG, WAN JAE PARK, KANG, Chang-Jin, JOO, Sukho, SOON OH PARK, YOO, Chung-Gon, SUNG KYEONG KIM, JOUNG HO LEE, CHO, Sang-Deog, WOON SUK HWANG, CHOI, Dae-Kyu, KIM, Keeho, JANG, Jeong-Yeol, BEOM HOAN O, SEUNG GOL LEE, PARK, Se-Geun, KIM, Joohee, DUCK JIN CHUNG, SUNG PIL CHANG, JOO, Young-Chang
Published in Microelectronic engineering (01.02.2008)
Published in Microelectronic engineering (01.02.2008)
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Journal Article
Etching characteristics of photoresist and low- k dielectrics by Ar/O 2 ferrite-core inductively coupled plasmas
Kim, Hyoun Woo, Lee, Jong Woo, Hwang, Woon Suk, O, Beom Hoan, Lee, Seung Gol, Park, Se-Geun, Kim, Joohee, Chung, Duck Jin, Chang, Sung Pil, Joo, Young-Chang, Joo, Junghoon, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Joo, Sukho, Park, Soon Oh, Yoo, Chung-Gon, Kim, Sung Kyeong, Lee, Joung Ho, Cho, Sang-Deog, Choi, Dae-Kyu, Kim, Keeho, Jang, Jeong-Yeol
Published in Microelectronic engineering (01.02.2008)
Published in Microelectronic engineering (01.02.2008)
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Journal Article
Study of ashing for low-k dielectrics using the N 2/O 2 ferrite-core inductively coupled plasmas
Kim, Hyoun Woo, Myung, Ju Hyun, Kim, Nam Ho, Lee, Han Sup, Park, Se-Geun, Lee, Jae Gab, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Yoo, Chung-Gon, Ko, Kwang-Hyuk, Woo, Je-Ho, Choi, Sang-Don, Choi, Dae-Kyu
Published in Thin solid films (26.05.2006)
Published in Thin solid films (26.05.2006)
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Journal Article
Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas
Kim, H W, Myung, J H, Kim, N H, Lee, H S, Park, S G, Lee, J G, Chung, C W, Park, W J, Kang, C J, Yoo, C G, Ko, K H, Woo, J H, Choi, S D, Choi, D K
Published in Thin solid films (26.05.2006)
Published in Thin solid films (26.05.2006)
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Journal Article
Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas
HYOUN WOO KIM, JU HYUN MYUNG, KO, Kwang-Hyuk, WOO, Je-Ho, CHOI, Sang-Don, CHOI, Dae-Kyu, NAM HO KIM, HAN SUP LEE, SE-GEUN PARK, JAE GAB LEE, CHIN WOOK CHUNG, WAN JAE PARK, CHANG-JIN KANG, YOO, Chung-Gon
Published in Thin solid films (2006)
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Published in Thin solid films (2006)
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