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Published in ACS catalysis (04.12.2015)
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Year of Publication 30.12.2020
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ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM PHOTOMASK PATTERN FORMING METHOD METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
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Year of Publication 15.09.2017
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ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
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DENTURE BASE COATING COMPOSITION, COATING FILM-BEARING DENTURE BASE, PLATE DENTURE, AND METHOD FOR PRODUCING COATING FILM-BEARING DENTURE BASE
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Year of Publication 09.08.2018
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