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Published in Macromolecules (20.04.1999)
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Advanced Cu CMP pad for reducing scratches
Tano, Hiroyuki, Yokoi, Katsutaka, Nishimura, Hideki, Maekawa, Ayako, Hirao, Takami, Kamo, Satoshi
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
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