Study on silicon removal property and surface smoothing phenomenon by moderate-pressure microwave hydrogen plasma
Ohmi, Hiromasa, Kimoto, Kenta, Nomura, Toshimitsu, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Published in Materials science in semiconductor processing (01.07.2021)
Published in Materials science in semiconductor processing (01.07.2021)
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Journal Article
Diffusion of excessively adsorbed hydrogen atoms on hydrogen terminated Si(100)(2×1) surface
Inagaki, Kouji, Morikawa, Yoshitada, Ohmi, Hiromasa, Yasutake, Kiyoshi, Kakiuchi, Hiroaki
Published in AIP advances (01.08.2021)
Published in AIP advances (01.08.2021)
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Journal Article
Interface properties of SiOxNy layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation
Zhuo, Zeteng, Sannomiya, Yuta, Kanetani, Yuki, Yamada, Takahiro, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Published in Nanoscale research letters (01.05.2013)
Published in Nanoscale research letters (01.05.2013)
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Journal Article
Surface cleaning and etching of 4H-SiC(0001) using high-density atmospheric pressure hydrogen plasma
Watanabe, Heiji, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Hosoi, Takuji, Shimura, Takayoshi, Yasutake, Kiyoshi
Published in Journal of nanoscience and nanotechnology (01.04.2011)
Published in Journal of nanoscience and nanotechnology (01.04.2011)
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Journal Article
High-rate preparation of thin Si films by atmospheric-pressure plasma enhanced chemical transport
Kamada, Daiki, Kishimoto, Kazuya, Kakiuchi, Hiroaki, Yasutake, Kiyoshi, Ohmi, Hiromasa
Published in Surface and interface analysis (01.06.2008)
Published in Surface and interface analysis (01.06.2008)
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Journal Article
Conference Proceeding
Photoluminescence Study of Defect-Free Epitaxial Silicon Films Grown at Low Temperatures by Atmospheric Pressure Plasma Chemical Vapor Deposition
Yasutake, Kiyoshi, Tawara, Naotaka, Ohmi, Hiromasa, Terai, Yoshikazu, Kakiuchi, Hiroaki, Watanabe, Heiji, Fujiwara, Yasufumi
Published in Japanese Journal of Applied Physics (01.04.2007)
Published in Japanese Journal of Applied Physics (01.04.2007)
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Journal Article
Heteroepitaxial growth of cubic SiC on Si using very-high-frequency plasma at atmospheric pressure
Kakiuchi, Hiroaki, Ohmi, Hiromasa, Aketa, Masatoshi, Nakamura, Ryota, Yasutake, Kiyoshi
Published in Surface and interface analysis (01.06.2008)
Published in Surface and interface analysis (01.06.2008)
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Journal Article
Conference Proceeding