Reactive force-field molecular dynamics simulation for the surface reaction of SiH (x = 2–4) species on Si(1 0 0)-(2 × 1):H surfaces in chemical vapor deposition processes
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, Tokumasu, Takashi
Published in Computational materials science (01.03.2022)
Published in Computational materials science (01.03.2022)
Get full text
Journal Article
Crystal orientation of epitaxial oxide film on silicon substrate
Kaneko, Satoru, Tokumasu, Takashi, Yasui, Manabu, Kurouchi, Masahito, Yasuhara, Shigeo, Endo, Tamio, Azuma, Masaki, Matsuda, Akufumi, Yoshimoto, Mamoru, Sahoo, Sumanta Kumar, Sardar, Kripasindhu, Ting, Jyh-Ming, Yoshimura, Masahiro
Published in Applied surface science (01.06.2022)
Published in Applied surface science (01.06.2022)
Get full text
Journal Article
Carbon clusters on substrate surface for graphene growth- theoretical and experimental approach
Kaneko, Satoru, Tokumasu, Takashi, Yasui, Manabu, Kurouchi, Masahito, Tanaka, Satomi, Kato, Chihiro, Yasuhara, Shigeo, Endo, Tamio, Matsuda, Akifumi, Yoshimoto, Mamoru, Can, Musa, Sahoo, Sumanta Kumar, Sardar, Kripasindhu, Ting, Jyh-Ming, Yoshimura, Masahiro
Published in Scientific reports (22.09.2022)
Published in Scientific reports (22.09.2022)
Get full text
Journal Article
Crystal orientation of epitaxial film deposited on silicon surface
Kaneko, Satoru, Tokumasu, Takashi, Yasui, Manabu, Kurouchi, Masahito, Shiojiri, Daishi, Yasuhara, Shigeo, Sahoo, Sumanta Kumar, Can, Musa Mutlu, Yu, Ruei Sung, Sardar, Kripasindhu, Yoshimura, Masahiro, Azuma, Masaki, Matsuda, Akifumi, Yoshimoto, Mamoru
Published in Scientific reports (13.05.2024)
Published in Scientific reports (13.05.2024)
Get full text
Journal Article
Biocompatibility of conformal silicon carbide on carbon nanowall scaffolds
Ono, Koki, Koide, Takashi, Ishikawa, Kenji, Tanaka, Hiromasa, Kondo, Hiroki, Sugawara-Narutaki, Ayae, Jin, Yong, Yasuhara, Shigeo, Hori, Masaru, Takeuchi, Wakana
Published in Japanese Journal of Applied Physics (01.01.2023)
Published in Japanese Journal of Applied Physics (01.01.2023)
Get full text
Journal Article
Reactive Force-Field Molecular Dynamics Study of the Effect of Gaseous Species on SiliconGermanium Alloy Growth by PECVD Techniques
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, Tokumasu, Takashi
Published in 2021 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2021)
Published in 2021 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2021)
Get full text
Conference Proceeding
Reactive Force-Field Molecular Dynamics Study of the Silicon-Germanium Deposition Processes by Plasma Enhanced Chemical Vapor Deposition
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, Tokumasu, Takashi
Published in 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (23.09.2020)
Published in 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (23.09.2020)
Get full text
Conference Proceeding
Molecular Dyanamics Simulation of Thermal Chemical Vapor Deposition for Hydrogenated Amorphous Silicon on Si (100) Substrate by Reactive Force-Field
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, Tokumasu, Takashi
Published in 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (01.09.2019)
Published in 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (01.09.2019)
Get full text
Conference Proceeding
Constriction of a lattice constant in an epitaxial magnesium oxide film deposited on a silicon substrate
Kaneko, Satoru, Tokumasu, Takashi, Nakamaru, Yoshimi, Kokubun, Chiemi, Konda, Kayoko, Yasui, Manabu, Kurouchi, Masahito, Can, Musa, Shawuti, Shalima, Sudo, Rieko, Endo, Tamio, Yasuhara, Shigeo, Matsuda, Akifumi, Yoshimoto, Mamoru
Published in Japanese Journal of Applied Physics (01.02.2019)
Published in Japanese Journal of Applied Physics (01.02.2019)
Get full text
Journal Article
Erratum to: The influences of filament temperature on the structure of boron nitride films and its tribological characterization for microforming die application
Jin, Yong, Yasuhara, Shigeo, Shimizu, Tetsuhide, Yang, Ming
Published in Manufacturing review (Ulis, France) (2015)
Published in Manufacturing review (Ulis, France) (2015)
Get full text
Journal Article
Layer-by-Layer Growth of Graphene on Insulator in CO2‑Oxidizing Environment
Kaneko, Satoru, Ito, Takeshi, Kato, Chihiro, Tanaka, Satomi, Yasuhara, Shigeo, Matsuda, Akifumi, Yoshimoto, Mamoru
Published in ACS omega (30.04.2017)
Published in ACS omega (30.04.2017)
Get full text
Journal Article
Reactive Force Field Molecular Dynamics Study of the Effects of Gaseous Species on the Composition and Crystallinity of Silicon–Germanium Thin Films
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, Tokumasu, Takashi
Published in Crystal growth & design (05.07.2023)
Published in Crystal growth & design (05.07.2023)
Get full text
Journal Article
Reactive force-field molecular dynamics simulation for the surface reaction of SiHx (x = 2–4) species on Si(100)-(2 × 1):H surfaces in chemical vapor deposition processes
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, Tokumasu, Takashi
Published in Computational materials science (01.03.2022)
Published in Computational materials science (01.03.2022)
Get full text
Journal Article
Reactive Force Field Molecular Dynamics Studies of the Initial Growth of Boron Nitride Using BCl 3 and NH 3 by Atomic Layer Deposition
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, van Duin, Adri C. T., Tokumasu, Takashi
Published in Journal of physical chemistry. C (25.01.2024)
Published in Journal of physical chemistry. C (25.01.2024)
Get full text
Journal Article
Reactive Force Field Molecular Dynamics Studies of the Initial Growth of Boron Nitride Using BCl3 and NH3 by Atomic Layer Deposition
Uene, Naoya, Mabuchi, Takuya, Zaitsu, Masaru, Yasuhara, Shigeo, van Duin, Adri C. T., Tokumasu, Takashi
Published in Journal of physical chemistry. C (25.01.2024)
Published in Journal of physical chemistry. C (25.01.2024)
Get full text
Journal Article