Fabrication of CoSi 2 -Buried-Metal-Layer Si Substrates for Infrared Reflection Absorption Spectroscopy by Wafer-Bonding
Yamamura, Shusaku, Yamauchi, Shouichi, Watanabe, Satoru, Tabe, Michiharu, Kasai, Toshio, Nonogaki, Youichi, Urisu, Tsuneo
Published in Japanese Journal of Applied Physics (30.06.2003)
Published in Japanese Journal of Applied Physics (30.06.2003)
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Journal Article
Semiconductor device having P-N column layer and method for manufacturing the same
Shibata, Takumi, Yamauchi, Shouichi, Nogami, Syouji, Yamaoka, Tomonori
Year of Publication 17.01.2012
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Year of Publication 17.01.2012
Patent