Alternating Phase Shift Mask in Extreme Ultra Violet Lithography
Sugawara, Minoru, Chiba, Akira, Yamanashi, Hiromasa, Nishiyama, Iwao
Published in Japanese Journal of Applied Physics (2003)
Published in Japanese Journal of Applied Physics (2003)
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Journal Article
Image Simulation of Extreme Ultraviolet Lithography Optics: Effect of Multilayer Coatings
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Conference Proceeding
Journal Article
Estimation of Mask Placement Error Caused by Multilayer Stress Profile
Chiba, Akira, Sugawara, Minoru, Yamanashi, Hiromasa, Nishiyama, Iwao
Published in Japanese Journal of Applied Physics (01.01.2003)
Published in Japanese Journal of Applied Physics (01.01.2003)
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Journal Article
Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera
Chiba, Akira, Oizumi, Hiroaki, Yamanashi, Hiromasa, Hoko, Hiromasa, Nishiyama, Iwao, Ogawa, Tarou, Okazaki, Shinji
Published in Japanese Journal of Applied Physics (01.01.2002)
Published in Japanese Journal of Applied Physics (01.01.2002)
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Journal Article
Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer
Lee, Byoung Taek, Hoshino, Eiichi, Takahashi, Masashi, Yoneda, Takashi, Yamanashi, Hiromasa, Hoko, Hiromasa, Ryoo, ManHyoung, Chiba, Akira, Ito, Masaaki, Sugawara, Minoru, Ogawa, Tarou, Okazaki, Sinji
Published in Japanese Journal of Applied Physics (01.12.2001)
Published in Japanese Journal of Applied Physics (01.12.2001)
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Journal Article
Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks
Ogawa, Taro, Ito, Masaaki, Takahashi, Masashi, Hoko, Hiromasa, Yamanashi, Hiromasa, Hoshino, Eiichi, Okazaki, Shinji, Sekine, Keiichi, Kataoka, Izumi
Published in Japanese Journal of Applied Physics (01.04.2002)
Published in Japanese Journal of Applied Physics (01.04.2002)
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Journal Article
Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
Chiba, Akira, Takahashi, Masashi, Yamanashi, Hiromasa, Hoko, Hiromasa, Hoshino, Eiichi, Hirano, Naoya, Lee, Byoung Taek, Ogawa, Tarou, Ito, Masaaki, Okazaki, Sinji
Published in Japanese Journal of Applied Physics (01.06.2001)
Published in Japanese Journal of Applied Physics (01.06.2001)
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Journal Article
Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching
Chiba, Akira, Hoshino, Eiichi, Takahashi, Masashi, Yamanashi, Hiromasa, Hoko, Hiromasa, Lee, Byoung Taek, Yoneda, Takashi, Ito, Masaaki, Ogawa, Taro, Okazaki, Shinji
Published in Japanese Journal of Applied Physics (01.12.2001)
Published in Japanese Journal of Applied Physics (01.12.2001)
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Journal Article
Photon-stimulated ion desorption measurement of organosilicon resist reactions in extreme ultraviolet lithography
OGAWA, T, YAMAGUCHI, A, YAMANASHI, H, ITO, M, TACHIBANA, H, MATSUMOTO, M, SEKITANI, T, TANAKA, K
Published in Japanese Journal of Applied Physics (01.12.1996)
Published in Japanese Journal of Applied Physics (01.12.1996)
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Conference Proceeding
Journal Article
SCANNING ELECTRON MICROSCOPE
FUKUDA MUNEYUKI, OHASHI TAKEYOSHI, KOMURO OSAMU, SOHDA YASUNARI, YAMANASHI HIROMASA
Year of Publication 13.03.2013
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Year of Publication 13.03.2013
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