Inductively Coupled Plasma Source with Internal Straight Antenna
Kanoh, Masaaki, Suzuki, Keiji, Tonotani, Jyunichi, Aoki, Katsuaki, Yamage, Masashi
Published in Japanese Journal of Applied Physics (01.09.2001)
Published in Japanese Journal of Applied Physics (01.09.2001)
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Journal Article
End-point Detection of Reactive Ion Etching by Plasma Impedance Monitoring
Kanoh, Masaaki, Yamage, Masashi, Takada, Hiroyuki
Published in Japanese Journal of Applied Physics (01.03.2001)
Published in Japanese Journal of Applied Physics (01.03.2001)
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Journal Article
Optical emission and microwave field intensity measurements in surface wave-excited planar plasma
NAGATSU, M, XU, G, YAMAGE, M, KANOH, M, SUGAI, H
Published in Japanese Journal of Applied Physics (01.03.1996)
Published in Japanese Journal of Applied Physics (01.03.1996)
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Journal Article
Formation of Ammonium Salts and Their Effects on Controlling Pattern Geometry in the Reactive Ion Etching Process for Fabricating Aluminum Wiring and Polysilicon Gate
Saito, Shuichi, Sugita, Kazuyuki, Tonotani, Junichi, Yamage, Masashi
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Journal Article
Investigation of plasma-induced damage in silicon trench etching
Kuboi, Shuichi, Yamage, Masashi, Ishikawa, Satoshi
Published in 2016 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2016)
Published in 2016 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2016)
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Conference Proceeding
Initial boronization of JT-60U tokamak using decaborane
SAIDOH, M, OGIWARA, N, YAGYU, J, SUGIE, T, SAKASAI, A, ASAKURA, N, YAMAGE, M, SUGAI, H, JACKSON, G. L, SHIMADA, M, ARAI, T, HIRATSUKA, H, KOIKE, T, SHIMIZU, M, NINOMIYA, H, NAKAMURA, H, JIMBOU, R
Published in Japanese Journal of Applied Physics (01.07.1993)
Published in Japanese Journal of Applied Physics (01.07.1993)
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Journal Article