Ion-Implanted TiN Metal Gate With Dual Band-Edge Work Function and Excellent Reliability for Advanced CMOS Device Applications
Xu, Qiuxia, Xu, Gaobo, Zhou, Huajie, Zhu, Huilong, Liang, Qingqing, Liu, Jinbiao, Li, Junfeng, Xiang, Jinjuan, Xu, Miao, Zhong, Jian, Xu, Weijia, Zhao, Chao, Chen, Dapeng, Ye, Tianchun
Published in IEEE transactions on electron devices (01.12.2015)
Published in IEEE transactions on electron devices (01.12.2015)
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Inverted process for graphene integrated circuits fabrication
Lv, Hongming, Wu, Huaqiang, Liu, Jinbiao, Huang, Can, Li, Junfeng, Yu, Jiahan, Niu, Jiebin, Xu, Qiuxia, Yu, Zhiping, Qian, He
Published in Nanoscale (07.06.2014)
Published in Nanoscale (07.06.2014)
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Improving schoolyard wind environments: Case studies in two schools in Nanjing
Liu, Anqi, Xu, Qiuxia, Gao, Jiahao, Xu, Zhen, Han, Lingyun
Published in Geographica Pannonnica (2019)
Published in Geographica Pannonnica (2019)
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Establishment of a rat model for uterine leiomyomas based on Western and traditional Chinese medicine theories
Zhao, Hui, Li, Yao, Xu, QiuXia, Peng, Fu, Zhao, JinShuang, Webb, R Clinton, Peng, Cheng, Yu, ChengHao
Published in Brazilian journal of medical and biological research (01.01.2018)
Published in Brazilian journal of medical and biological research (01.01.2018)
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Cryogenic Transport Characteristics of P-Type Gate-All-Around Silicon Nanowire MOSFETs
Gu, Jie, Zhang, Qingzhu, Wu, Zhenhua, Yao, Jiaxin, Zhang, Zhaohao, Zhu, Xiaohui, Wang, Guilei, Li, Junjie, Zhang, Yongkui, Cai, Yuwei, Xu, Renren, Xu, Gaobo, Xu, Qiuxia, Yin, Huaxiang, Luo, Jun, Wang, Wenwu, Ye, Tianchun
Published in Nanomaterials (Basel, Switzerland) (26.01.2021)
Published in Nanomaterials (Basel, Switzerland) (26.01.2021)
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Fabrication of Bulk-Si FinFET using CMOS compatible process
Zhou, Huajie, Song, Yi, Xu, Qiuxia, Li, Yongliang, Yin, Huaxiang
Published in Microelectronic engineering (01.06.2012)
Published in Microelectronic engineering (01.06.2012)
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Journal Article
Investigation of Key Technologies for Poly-Si/TaN/HfLaON/IL Gate-Stacks in Advanced Device Applications
Xu, Qiuxia, Xu, Gaobo, Li, Yongliang, Zhou, Huajie, Li, Junfeng, Niu, Jiebin, Ding, Mingzheng, Chen, Dapeng, Ye, Tianchun
Published in IEEE transactions on electron devices (01.04.2014)
Published in IEEE transactions on electron devices (01.04.2014)
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Journal Article
Interfacial Elastic Dipoles: A New EOT Shifting Mechanism in HKMG Devices
Liang, Qingqing, Xu, Qiuxia, Zhu, Huilong, Zhong, Huicai, Li, Junfeng, Zhao, Chao, Chen, Dapeng, Ye, Tianchun
Published in IEEE electron device letters (01.06.2012)
Published in IEEE electron device letters (01.06.2012)
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Journal Article
Design and optimization considerations for bulk gate-all-around nanowire MOSFETs
Song, Yi, Xu, Qiuxia, Zhou, Huajie, Cai, Xiaowu
Published in Semiconductor science and technology (01.10.2009)
Published in Semiconductor science and technology (01.10.2009)
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Journal Article
SOI technology for radio-frequency integrated-circuit applications
Yang, Rong, Qian, He, Li, Junfeng, Xu, Qiuxia, Hai, Chaohe, Han, Zhengsheng
Published in IEEE transactions on electron devices (01.06.2006)
Published in IEEE transactions on electron devices (01.06.2006)
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