Modification of Ultra Low-k Dielectric Films by O 2 and CO 2 Plasmas
Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W., Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R.
Published in ECS journal of solid state science and technology (2015)
Published in ECS journal of solid state science and technology (2015)
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Journal Article
Modification of Ultra Low-k Dielectric Films by O2 and CO2 Plasmas
Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W., Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R.
Published in ECS journal of solid state science and technology (18.10.2014)
Published in ECS journal of solid state science and technology (18.10.2014)
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Journal Article
Study of SF 6 /N 2 O Microwave Plasma for Surface Texturing of Multicrystalline (<150 µm) Solar Substrates
Chan, Boon Teik, Kunnen, Eddy, Uhlig, Matthias, Marneffe, Jean-Francois de, Xu, Kaidong, Boullart, Werner, Rau, Bernd, Poortmans, Jef
Published in Japanese Journal of Applied Physics (01.10.2012)
Published in Japanese Journal of Applied Physics (01.10.2012)
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Journal Article
Study of SF 6 /N 2 O Microwave Plasma for Surface Texturing of Multicrystalline (<150 µm) Solar Substrates
Chan, Boon Teik, Kunnen, Eddy, Uhlig, Matthias, Marneffe, Jean-Francois de, Xu, Kaidong, Boullart, Werner, Rau, Bernd, Poortmans, Jef
Published in Japanese Journal of Applied Physics (01.10.2012)
Published in Japanese Journal of Applied Physics (01.10.2012)
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Journal Article
Sidewall Kink Elimination of Slanted Gratings Utilizing a Twice-Etching Method
Gao, Jiuru, He, Zhiwei, Dong, Shuo, Xie, Tingting, Yang, Yuxin, Zhuang, Shiwei, Xu, Kaidong
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
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Conference Proceeding
Enabling Plasma Etch Solution for GaN Technology
Wang, Zoe, Guo, Chunxiang, Liu, Jian, Feng, Yingxiong, Guan, Lulu, Xu, Kangning, Huang, Qiao, Chen, Lu, Xu, Kaidong
Published in 2023 China Semiconductor Technology International Conference (CSTIC) (26.06.2023)
Published in 2023 China Semiconductor Technology International Conference (CSTIC) (26.06.2023)
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Conference Proceeding
Effects of Ion Incident Angles on Etching Morphology of Blazed Grating by IBE
Yuan, Jie, Li, Xingyu, Jiang, Zhongyuan, Yang, Yuxin, Li, Jiahe, Xu, Kaidong, Zhuang, Shiwei
Published in 2022 China Semiconductor Technology International Conference (CSTIC) (20.06.2022)
Published in 2022 China Semiconductor Technology International Conference (CSTIC) (20.06.2022)
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Conference Proceeding
A Novel Thin Film Deposition Method by IBD for Asymmetrical Patterns
Li, Zichao, Xu, Kangning, Xu, Fei, Yang, Yuxin, Dong, Shuo, Huang, Qiao, Li, Cheng, Cui, Hushan, Liu, Wuping, Chen, Lu, Xu, Kaidong
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
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Conference Proceeding
Ion Beam Shaping as a Solution for Ultra-High Precision Planarization Process
Guo, Lei, Yang, Yuxin, Sun, Fang, Zheng, Zhiyuan, Wei, Xiaoxiu, Liang, Feng, Li, Cheng, Cui, Hushan, Hu, Dongdong, Chen, Lu, Xu, Kaidong
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
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Conference Proceeding
A Fully Automated VPD System for Noble Metal Control During CIS Manufacturing
Huang, Qiao, Cui, Hushan, Zou, Zhiwen, Cheng, Shiran, Zhu, Lei, Zhang, Hao, Xue, Chaobo, Feng, Jiali, Hua, Qiang, Zhu, Xiaoqing, Liu, Wuping, Xu, Kaidong
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
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Conference Proceeding
Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology
Marneffe, Jean-Fran\{c}ois de, Lazzarino, Frédéric, Goossens, Danny, Vandervorst, Alain, Richard, Olivier, Shamiryan, Denis, Xu, Kaidong, Truffert, Vincent, Boullart, Werner
Published in Japanese Journal of Applied Physics (01.08.2011)
Published in Japanese Journal of Applied Physics (01.08.2011)
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Journal Article
Reaction chamber lining
Liu, Haiyang, Chen, Zhaochao, Xu, Kaidong, Hou, Yonggang, Wang, Chengyi, Cheng, Shiran, Li, Na, Hu, Dongdong
Year of Publication 08.10.2024
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Year of Publication 08.10.2024
Patent
Etching uniformity regulating device and method
Liu, Xiaobo, Chen, Lu, Li, Xuedong, Xu, Kaidong, Hou, Yonggang, Li, Na, Qiu, Yong, Hu, Dongdong
Year of Publication 02.07.2024
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Year of Publication 02.07.2024
Patent
Rotatable faraday cleaning apparatus and plasma processing system
Wu, Zhihao, Liu, Haiyang, Liu, Xiaobo, Xu, Kaidong, Cheng, Shiran, Li, Na, Guo, Song, Hu, Dongdong
Year of Publication 11.06.2024
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Year of Publication 11.06.2024
Patent
Influence of Different Pressures on Characteristics of Plasmas in PECVD Chamber
Li, Xingyu, Hu, Yongjie, Yuan, Jie, Guan, Lulu, Liu, Xiaobo, Hu, Dongdong, Chen, Lu, Xu, Kaidong, Zhuang, Shiwei
Published in 2021 China Semiconductor Technology International Conference (CSTIC) (14.03.2021)
Published in 2021 China Semiconductor Technology International Conference (CSTIC) (14.03.2021)
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Conference Proceeding
Device for blocking plasma backflow in process chamber to protect air inlet structure
Wu, Zhihao, Liu, Haiyang, Liu, Xiaobo, Xu, Kaidong, Cheng, Shiran, Li, Na, Guo, Song, Hu, Dongdong
Year of Publication 09.04.2024
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Year of Publication 09.04.2024
Patent
Challenges with Respect to High-k/Metal Gate Stack Etching and Cleaning
Vos, Rita, Arnauts, Sophia, Bovie, Inge, Onsia, Bart, Garaud, Sylvain, Xu, Kaidong, Hongyu, Yu, Kubicek, Stefan, Rohr, Erika, Schram, Tom, Veloso, Anabela, Conard, Thierry, Leunissen, Leonardus H.A., Mertens, P.
Published in ECS transactions (28.09.2007)
Published in ECS transactions (28.09.2007)
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Journal Article
Inductively coupled plasma treatment system
Liu, Haiyang, Liu, Xiaobo, Li, Xuedong, Xu, Kaidong, Cheng, Shiran, Li, Na, Guo, Song, Hu, Dongdong
Year of Publication 05.12.2023
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Year of Publication 05.12.2023
Patent