Characterization of carbon-doped SiO2 low k thin films : Preparation by plasma-enhanced chemical vapor deposition from tetramethylsilane
HAN, Licheng M, PAN, Ji-Sheng, CHEN, Shou-Mian, BALASUBRAMANIAN, N, SHI, Jianou, LING SOON WONG, FOO, P. D
Published in Journal of the Electrochemical Society (01.07.2001)
Published in Journal of the Electrochemical Society (01.07.2001)
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Journal Article
Characterization of Carbon-Doped SiO[sub 2] Low k Thin Films: Preparation by Plasma-Enhanced Chemical Vapor Deposition from Tetramethylsilane
Han, Licheng M., Pan, Ji-Sheng, Chen, Shou-Mian, Balasubramanian, N., Shi, Jianou, Wong, Ling Soon, Foo, P. D.
Published in Journal of the Electrochemical Society (2001)
Published in Journal of the Electrochemical Society (2001)
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Journal Article
Effects of low k film properties on electromigration performance
Wei Lu, Yeow Kheng Lim, See, A., Tae Jong Lee, Liang Choo Hsia, Hander, J., Haiying Fu, Ling Soon Wong, Fong Pin Fen
Published in 2004 IEEE International Reliability Physics Symposium. Proceedings (2004)
Published in 2004 IEEE International Reliability Physics Symposium. Proceedings (2004)
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