High-κ Dielectric Materials for Microelectronics
Wallace, Robert M., Wilk, Glen D.
Published in Critical reviews in solid state and materials sciences (01.10.2003)
Published in Critical reviews in solid state and materials sciences (01.10.2003)
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Journal Article
(Invited) Current Status of High-k and Metal Gates in CMOS
Wilk, Glen D., Verghese, Mohith, Chen, Peijun, Maes, Jan Willem
Published in ECS transactions (15.03.2013)
Published in ECS transactions (15.03.2013)
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Journal Article
Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV
Gilmer, David C., Colombo, Daniel G., Taylor, Charles J., Roberts, Jeff, Haugstad, Greg, Campbell, Stephen A., Kim, Hyeon-Seag, Wilk, Glen D., Gribelyuk, Michael A., Gladfelter, Wayne L.
Published in Chemical vapor deposition (01.01.1998)
Published in Chemical vapor deposition (01.01.1998)
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Journal Article
High-[kappa] Dielectric Materials for Microelectronics
Wallace, Robert M, Wilk, Glen D
Published in Critical reviews in solid state and materials sciences (01.12.2003)
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Published in Critical reviews in solid state and materials sciences (01.12.2003)
Journal Article
Low temperature CVD of crystalline titanium dioxide films using tetranitratotitanium(IV)
GILMER, D. C, COLOMBO, D. G, TAYLOR, C. J, ROBERTS, J, HAUGSTAD, G, CAMPBELL, S. A, KIM, H.-S, WILK, G. D, GRIBELYUK, M. A, GLADFELTER, W. L
Published in Chemical vapor deposition (1998)
Published in Chemical vapor deposition (1998)
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Journal Article