High-κ Dielectric Materials for Microelectronics
Wallace, Robert M., Wilk, Glen D.
Published in Critical reviews in solid state and materials sciences (01.10.2003)
Published in Critical reviews in solid state and materials sciences (01.10.2003)
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Wafer-Scale Atomic Layer-Deposited TeOx/Te Heterostructure P-Type Thin-Film Transistors
Tan, Pukun, Niu, Chang, Lin, Zehao, Lin, Jian-Yu, Long, Linjia, Zhang, Yizhi, Wilk, Glen, Wang, Haiyan, Ye, Peide D
Published in Nano letters (01.10.2024)
Published in Nano letters (01.10.2024)
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Journal Article
Wafer-Scale Atomic Layer-Deposited TeO x /Te Heterostructure P-Type Thin-Film Transistors
Tan, Pukun, Niu, Chang, Lin, Zehao, Lin, Jian-Yu, Long, Linjia, Zhang, Yizhi, Wilk, Glen, Wang, Haiyan, Ye, Peide D
Published in Nano letters (01.10.2024)
Published in Nano letters (01.10.2024)
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METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING TRANSITION METALS
IWASHITA SHINYA, FARM ELINA, BAKKE JONATHAN, DEZELAH CHARLES, SAHA ARPITA, MAES JAN WILLEM, ROMERO PATRICIO EDUARDO, NIEMELA JANNE PETTERI, TUOMINEN MARKO, SAARE HOLGER, WILK GLEN, TOIS EVA, BYUN YOUNGCHOL, ZHU CHIYU
Year of Publication 25.03.2024
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Year of Publication 25.03.2024
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(Invited) Current Status of High-k and Metal Gates in CMOS
Wilk, Glen D., Verghese, Mohith, Chen, Peijun, Maes, Jan Willem
Published in ECS transactions (15.03.2013)
Published in ECS transactions (15.03.2013)
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Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV
Gilmer, David C., Colombo, Daniel G., Taylor, Charles J., Roberts, Jeff, Haugstad, Greg, Campbell, Stephen A., Kim, Hyeon-Seag, Wilk, Glen D., Gribelyuk, Michael A., Gladfelter, Wayne L.
Published in Chemical vapor deposition (01.01.1998)
Published in Chemical vapor deposition (01.01.1998)
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Journal Article
High-[kappa] Dielectric Materials for Microelectronics
Wallace, Robert M, Wilk, Glen D
Published in Critical reviews in solid state and materials sciences (01.12.2003)
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Published in Critical reviews in solid state and materials sciences (01.12.2003)
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Investigation of Scaling Limits for PECVD SiN and ALD HfO2/Al2O3 Integrated MIM Capacitors
Dornisch, Dieter, Wilk, Glen, Li, Guangming, Ring, Kenneth M M., Howard, David J J., Racanelli, Marco
Published in ECS transactions (27.04.2007)
Published in ECS transactions (27.04.2007)
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Journal Article
Impact of Hf-Precursor Choice on Scaling and Performance of High-k Gate Dielectrics
Maes, Jan Willem, Fedorenko, Yanina, Delabie, Annelies, Ragnarsson, Lars-Aåke, Swerts, Johan, Nyns, Laura, Van Elshocht, Sven, Wang, Changgong, Wilk, Glen
Published in ECS transactions (28.09.2007)
Published in ECS transactions (28.09.2007)
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SELECTIVE DEPOSITION OF METAL OXIDE
Deng, Shaoren, Han, YongGyu, Dezelah, Charles, Tuominen, Marko, Madhiwala, Viraj, Srinath, Nadadur Veeraraghavan, Zanders, David, Wilk, Glen, Vaidyula, Kranthi Kumar, Tois, Eva, Caro, Aranzazu Maestre, Vandalon, Vincent, Chiappe, Daniele
Year of Publication 22.08.2024
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Year of Publication 22.08.2024
Patent
METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING TRANSITION METALS
Iwashita, Shinya, Dezelah, Charles, Tuominen, Marko, Färm, Elina, Maes, Jan Willem, Romero, Patricio Eduardo, Saha, Arpita, Niemelä, Janne-Petteri, Wilk, Glen, Byun, YoungChol, Zhu, Chiyu, Saare, Holger, Tois, Eva, Bakke, Jonahtan
Year of Publication 21.03.2024
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Year of Publication 21.03.2024
Patent
Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
Fourmun Lee, Marcus, S., Shero, E., Wilk, G., Swerts, J., Maes, J.W., Blomberg, T., Delabie, A., Gros-Jean, M., Deloffre, E.
Published in 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.06.2007)
Published in 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.06.2007)
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Conference Proceeding