Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography
Wi, Seong Ju, Jang, Yong Ju, Kim, Haneul, Cho, Kyeongjae, Ahn, Jinho
Published in Membranes (Basel) (26.03.2022)
Published in Membranes (Basel) (26.03.2022)
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Journal Article
Study on ZrSi2 as a Candidate Material for Extreme Ultraviolet Pellicles
Wi, Seong Ju, Kim, Won Jin, Kim, Haneul, Jeong, Dongmin, Lee, Dong Gi, Choi, Jaehyuck, Cho, Sang Jin, Yu, Lan, Ahn, Jinho
Published in Membranes (Basel) (14.08.2023)
Published in Membranes (Basel) (14.08.2023)
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Journal Article
Study on ZrSi[sub.2] as a Candidate Material for Extreme Ultraviolet Pellicles
Wi, Seong Ju, Kim, Won Jin, Kim, Haneul, Jeong, Dongmin, Lee, Dong Gi, Choi, Jaehyuck, Cho, Sang Jin, Yu, Lan, Ahn, Jinho
Published in Membranes (Basel) (01.08.2023)
Published in Membranes (Basel) (01.08.2023)
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Journal Article
EUV Method and system for improving imaging performance of masks for EUV lithography
CHO MIN SUN, KIM SEON YONG, LEE DONG GI, KIM YUNSOO, AHN JINHO, JEONG DONGMIN, WI SEONG JU, SEOK JI HOO
Year of Publication 17.05.2024
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Year of Publication 17.05.2024
Patent
Pellicle structure with inter-mixing layer and manufacturing method therefor
JUNG HWAN KIM, JIN HO AHN, HA NEUL KIM, WI SEONG JU, WON JIN KIM, KIM CHANGSOO
Year of Publication 18.05.2023
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Year of Publication 18.05.2023
Patent