A system model for feedback control and analysis of yield: A multistep process model of effective gate length, poly line width, and IV parameters
Rietman, E.A., Whitlock, S.A., Beachy, M., Roy, A., Willingham, T.L.
Published in IEEE transactions on semiconductor manufacturing (01.02.2001)
Published in IEEE transactions on semiconductor manufacturing (01.02.2001)
Get full text
Journal Article