Adaptation of a commercial total reflection X-ray fluorescence system for wafer surface analysis equipped with a new generation of silicon drift detector
Pahlke, Siegfried, Meirer, Florian, Wobrauschek, Peter, Streli, Christina, Peter Westphal, Georg, Mantler, Claus
Published in Spectrochimica acta. Part B: Atomic spectroscopy (01.11.2006)
Published in Spectrochimica acta. Part B: Atomic spectroscopy (01.11.2006)
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