Film growth kinetics of chemical vapor deposition of copper from Cu(HFA)[sub 2]
Doheyoung Kim, Wentorf, R.H., Gill, W.N.
Published in Journal of the Electrochemical Society (01.11.1993)
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Published in Journal of the Electrochemical Society (01.11.1993)
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Low pressure chemically vapor deposited copper films for advanced device metallization
DO-HEYOUNG KIM, WENTORF, R. H, GILL, W. N
Published in Journal of the Electrochemical Society (01.11.1993)
Published in Journal of the Electrochemical Society (01.11.1993)
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Journal Article
Sintered Superhard Materials
Wentorf, R. H., DeVries, R. C., Bundy, F. P.
Published in Science (American Association for the Advancement of Science) (23.05.1980)
Published in Science (American Association for the Advancement of Science) (23.05.1980)
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Journal Article
Sintered superhard materials
Wentorf, R.H, DeVries, R.C, Bundy, F.P
Published in Science (American Association for the Advancement of Science) (23.05.1980)
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Published in Science (American Association for the Advancement of Science) (23.05.1980)
Journal Article
Thermochemical Hydrogen Generation
Wentorf, R. H., Hanneman, R. E.
Published in Science (American Association for the Advancement of Science) (26.07.1974)
Published in Science (American Association for the Advancement of Science) (26.07.1974)
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