The use of cross-section haze measurements to monitor Laser Spike Anneal (LSA) stage alignment
Wendt, Kay, Newby, John
Published in 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (10.05.2021)
Published in 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (10.05.2021)
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Conference Proceeding
Bare wafer analysis for wet cleaning efficiency - The impact of classification and sensitivity
Wendt, Kay, Wilbers, Fabian, Ruth, Jochen, Lorant, Christophe, Holsteyns, Frank, Newby, John, Bast, Gerhard, Sundar, Vignesh
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
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Conference Proceeding