Low energy boron implantation in silicon and room temperature diffusion
Collart, E.J.H, Weemers, K, Cowern, N.E.B, Politiek, J, Bancken, P.H.L, van Berkum, J.G.M, Gravesteijn, D.J
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.04.1998)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.04.1998)
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Journal Article
Low energy (0.25-10 keV) /sup 11/B/sup +/ ion implantation damage characterisation using Rutherford backscattering spectrometry
Collart, E.J.H., Heijdra, M., Weemers, K., Tamminga, Y., van Berkum, J.G.M., Verheijen, M.A.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
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Conference Proceeding