Performance of an image adjustment device for SCALPEL
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Conference Proceeding
Analysis of a SCALPEL™ multi-pass writing strategy
Zhu, X., Munro, E., Rouse, J.A., Liu, H., Waskiewicz, W.K.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Monte Carlo study of high performance resists for SCALPEL nanolithography
Ocola, L.E., Li, W-Y., Kasica, R.J., Blakey, M.I., Orphanos, P.A., Waskiewicz, W.K., Novembre, A.E., Sato, M.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Conference Proceeding
Global space charge effect in SCALPEL
Mkrtchyan, M., Munro, E., Liddle, J.A., Stanton, S.T., Waskiewicz, W.K., Farrow, R.C., Katsap, V.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Conference Proceeding
Marks for SCALPEL ® tool optics optimization
Farrow, R.C., Gallatin, G.M., Waskiewicz, W.K., Liddle, J.A., Kizilyalli, I., Kornblit, A., Biddick, C., Blakey, M., Klemens, F., Felker, J., Kraus, J., Mkrtchyan, M., Orphanos, P.A., Layadi, N., Merchant, S.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Conference Proceeding
CMOS compatible alignment marks for the SCALPEL proof of lithography tool
Farrow, R.C., Waskiewicz, W.K., Kizilyalli, I., Ocola, L., Felker, J., Biddick, C., Gallatin, G., Mkrtchyan, M., Blakey, M., Kraus, J., Novembre, A., Orphanos, P., Peabody, M., Kasica, R., Kornblit, A., Klemens, F.
Published in Microelectronic engineering (01.05.1999)
Published in Microelectronic engineering (01.05.1999)
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Conference Proceeding
An object pattern post-processor for validation of electron optical modelling
Munro, E., Zhu, X., Liu, H., Rouse, J.A., Waskiewicz, W.K.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
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Conference Proceeding
Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis
Waskiewicz, W.K., Harriott, L.R., Liddle, J.A., Stanton, S.T., Berger, S.D., Munro, E., Zhu, X.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Conference Proceeding
Optimization of a SCALPEL ® exposure tool using a diffractive image quality technique
Eichner, L., Blakey, M.I., Farrow, R.C., Liddle, J.A., Orphanos, P.A., Waskiewicz, W.K.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
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Journal Article
Conference Proceeding
Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)
Liddle, J.A., Blakey, M.I., Knurek, C.S., Mkrtchyan, M.M., Novembre, A.E., Ocola, L., Saunders, T., Waskiewicz, W.K.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Journal Article
Conference Proceeding
The SCALPEL proof of concept system
Harriott, L.R., Berger, S.D., Biddick, C., Blakey, M.I., Bowler, S.W., Brady, K., Camarda, R.M., Connelly, W.F., Crorken, A., Custy, J., DeMarco, R., Farrow, R.C., Felker, J.A., Fetter, L., Freeman, R., Hopkins, L., Huggins, H.A., Knurek, C.S., Kraus, J.S., Liddle, J.A., Mkrtychan, M., Novembre, A.E., Peabody, M.L., Tarascon, R.G., Wade, H.H., Waskiewicz, W.K., Watson, G.P., Werder, K.S., Windt, D.
Published in Microelectronic engineering (01.02.1997)
Published in Microelectronic engineering (01.02.1997)
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Journal Article
Mask technologies for soft-x-ray projection lithography at 13 nm
Tennant, D M, Fetter, L A, Harriott, L R, Macdowell, A A, Mulgrew, P P, Pastalan, J Z, Waskiewicz, W K, Windt, D L, Wood Ii, O R
Published in Applied optics (2004) (01.12.1993)
Published in Applied optics (2004) (01.12.1993)
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Soft-x-ray projection lithography experiments using Schwarzschild imaging optics
Tichenor, D A, Kubiak, G D, Malinowski, M E, Stulen, R H, Haney, S J, Berger, K W, Brown, L A, Sweatt, W C, Bjorkholm, J E, Freeman, R R, Himel, M D, Macdowell, A A, Tennant, D M, Wood, R, Bokor, J, Jewell, T E, Mansfield, W M, Waskiewicz, W K, White, D L, Windt, D L
Published in Applied optics (2004) (01.12.1993)
Published in Applied optics (2004) (01.12.1993)
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Soft-x-ray projection imaging with a 1:1 ring-field optic
Macdowell, A A, Bjorkholm, J E, Early, K, Freeman, R R, Himel, M D, Mulgrew, P P, Szeto, L H, Taylor, D W, Tennant, D M, Wood Ii, O R, Bokor, J, Eichner, L, Jewell, T E, Waskiewicz, W K, White, D L, Windt, D L, D'Souza, R M, Silfvast, W T, Zernike, F
Published in Applied optics (2004) (01.12.1993)
Published in Applied optics (2004) (01.12.1993)
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Experiments in projection lithography using soft x-rays
Bjorkholm, J.E., Bokor, J., Eichner, L., Freeman, R.R., Gregus, J., Jewell, T.E., Mansfield, W.M., MacDowell, A.A., O'Malley, M.L., Raab, E.L., Silfvast, W.T., Szeto, L.H., Tennant, D.M., Waskiewicz, W.K., White, D.L., Windt, D.L., Wood, O.R.
Published in Microelectronic engineering (01.01.1991)
Published in Microelectronic engineering (01.01.1991)
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Journal Article
Observation of strain in the Si(111) 7 x 7 surface
Robinson, IK, Waskiewicz, WK, Fuoss, PH, Norton, LJ
Published in Physical review. B, Condensed matter (15.03.1988)
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Published in Physical review. B, Condensed matter (15.03.1988)
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X-ray diffraction evidence of adatoms in the Si(111)7 x 7 reconstructed surface
Robinson, IK, Waskiewicz, WK, Fuoss, PH, Stark, JB, Bennett, PA
Published in Physical review. B, Condensed matter (15.05.1986)
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Published in Physical review. B, Condensed matter (15.05.1986)
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