Properties of titanium nitride films for barrier metal in aluminum ohmic contact systems
HARA, T, YAMANOUE, A, IIO, H, INOUE, K, WASHIDZU, G, NAKAMURA, S
Published in Japanese Journal of Applied Physics (01.07.1991)
Published in Japanese Journal of Applied Physics (01.07.1991)
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Journal Article
Dose and Damage Measurements in Low Dose Ion Implantation in Silicon by Photo-Acoustic Displacement and Minority Carrier Lifetime
Washidzu, Gen, Hara, Tohru, Ichikawa, Ryuji, Takamatsu, Hiroyuki, Sumie, Shingo, Nishimoto, Yoshiro, Nakai, Yasuhide, Hashizume, Hidehisa, Miyoshi, Tsunemichi
Published in Japanese Journal of Applied Physics (01.06.1991)
Published in Japanese Journal of Applied Physics (01.06.1991)
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Journal Article
Damage induced by electron cyclotron resonance plasma etching on silicon surface
WASHIDZU, G, HARA, T, HIYOSHI, J, SASAKI, M, SUZUKI, Y, UKAI, K
Published in Japanese Journal of Applied Physics (01.05.1991)
Published in Japanese Journal of Applied Physics (01.05.1991)
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Journal Article