A.I. Driven Process Control by Machine Learning Based Virtual Metrology for High Product Mix Manufacturing
Lee, Hyung Joo, Choi, Sanghyun, Greeneltch, Nathan, Jayaram, Srividya, Zhang, Shiwei, Wan, Qijian, Du, Chunshan
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
Published in 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) (17.03.2024)
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Conference Proceeding
Metrology Evaluation Indicators of Gate Line End Patterning of SRAM by Using SEM Contour Extraction
Wang, Rui, Ren, Kun, Gao, Dawei, Wu, Yongyu, Li, Xiaoci, Wan, Qijian, Zou, Sihang, Du, Chunshan
Published in 2023 International Workshop on Advanced Patterning Solutions (IWAPS) (26.10.2023)
Published in 2023 International Workshop on Advanced Patterning Solutions (IWAPS) (26.10.2023)
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Conference Proceeding
Photolithography Hotspot Detection Based on Deep Learning LHD Model
Jiang, Xiaolong, Ren, Kun, Lin, Zebang, Gao, Dawei, Wu, Yongyu, Jin, Yadong, Du, Chunshan, Tian, Zhengguo, Zou, Sihang, Sun, Chenwei, Hu, Xinyi, Wan, Qijian
Published in 2023 International Workshop on Advanced Patterning Solutions (IWAPS) (26.10.2023)
Published in 2023 International Workshop on Advanced Patterning Solutions (IWAPS) (26.10.2023)
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Conference Proceeding
Designing high quality test chips with improved coverage for design rule exploration, process variation improvement and hotspot discovery
Chen, Yining, Guo, Pang, Kwan, Joe, Kabeel, Aliaa, Rizk, Sarah, Du, Chunshan, Hu, Xinyi, Wan, Qijian, Yan, Xizi
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
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Conference Proceeding
Contour based process characterization and modeling for HVM
Zhou, Kan, Wan, Qijian, Chen, Ao, Zhou, Wenzhan, Du, Chunshan, Zhang, Recoo, Zhang, Yu, Wu, Wenming, Fenger, Germain, Rampoori, Seshadri
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
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Conference Proceeding
Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours and feed forward intra CDU by mask MTT
Zhou, Kan, Zhao, Hongwen, Zhou, Wenzhan, Zhang, Yu, Chen, Ao, Wu, Wenming, Wan, Qijian, Dou, Huaiyang, Du, Chunshan, Zhang, Liguo, Fenger, Germain
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
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Conference Proceeding
SONR based layout decomposition and applications
Xu, Rui, Li, Xuan, Jin, Yao, Jiang, Xiaolong, Yang, Lingxue, Ren, Kun, Wu, Yongyu, Gao, Dawei, Du, Chunshan, Wan, Qijian, Hu, Xinyi, Zou, Sihang, Jiang, Fan, Hong, Le
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
Published in 2022 International Workshop on Advanced Patterning Solutions (IWAPS) (21.10.2022)
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Conference Proceeding
Contour Based Solution For Identifying Mask Induced Error
Yu, Yinsheng, Liu, Guoping, Zhao, Hongwen, Zhou, Kan, Li, Yuhui, Zhou, Wenzhan, Zhang, Yu, Wan, Qijian, Chen, Ao, Du, Chunshan, Zhang, Liguo, Fenger, Germain
Published in 2021 International Workshop on Advanced Patterning Solutions (IWAPS) (12.12.2021)
Published in 2021 International Workshop on Advanced Patterning Solutions (IWAPS) (12.12.2021)
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Conference Proceeding
Reducing Systematic Defects using Calibre Wafer Defect Engineering and Machine Learning Solutions
Jiang, Jet, Hou, Frank, Li, Gavin, Chen, Summy, Fei, Marfei, Xie, Qian, Cao, Liang, Wan, Qijian, Hu, Xinyi, Du, Chunshan, Wang, David, Huang, Elven, Paninjath, Sankaranarayanan, Madhusudhan, Saikiran, Tian, Leo
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding