High-performance nMOSFETs using a novel strained Si/SiGe CMOS architecture
Olsen, S.H., O'Neill, A.G., Driscoll, L.S., Kwa, K.S.K., Chattopadhyay, S., Waite, A.M., Tang, Y.T., Evans, A.G.R., Norris, D.J., Cullis, A.G., Paul, D.J., Robbins, D.J.
Published in IEEE transactions on electron devices (01.09.2003)
Published in IEEE transactions on electron devices (01.09.2003)
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Journal Article
Optimization of Alloy Composition for High-Performance Strained-Si–SiGe N-Channel MOSFETs
Olsen, S.H., O'Neill, A.G., Driscoll, L.S., Chattopadhyay, S., Kwa, K.S.K., Waite, A.M., Tang, Y.T., Evans, A.G.R., Zhang, J.
Published in IEEE transactions on electron devices (01.07.2004)
Published in IEEE transactions on electron devices (01.07.2004)
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Journal Article
Etch rate modulation through ion implantation
Oteri, Guy, Waite, Andrew M, Prasad, Rajesh, Jo, Sungho, Shim, Kyu-Ha, Sherman, Steven Robert, Norasetthekul, Somchintana
Year of Publication 25.06.2019
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Year of Publication 25.06.2019
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