Search Results - "WILLWERTH MICHAEL D" :: K.UTB vyhledávací portál

Electrostatic chuck with reduced arcing

by PALAGASHVILI, DAVID, BUCHBERGER JR., DOUGLAS A, WILLWERTH, MICHAEL D, CHAFIN, MICHAEL G
Year of Publication 01.04.2016

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GAS FLOW EQUALIZER PLATE SUITABLE FOR USE IN A SUBSTRATE PROCESS CHAMBER

by BALAKRISHNA, AJIT, RAUF, SHAHID, NGUYEN, ANDREW, TODOROW, VALENTIN D, WILLWERTH, MICHAEL D
Year of Publication 05.11.2009

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Method and apparatus for performing limited area spectral analysis

by Davis, Matthew F, Lian, Lei, Uo, Yasuhiro, Willwerth, Michael D, Netchitaliouk, Andrei Ivanovich
Year of Publication 13.10.2009

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Method and apparatus for performing limited area spectral analysis

by LIAN LEI, UO YASUHIRO, WILLWERTH MICHAEL D, NETCHITALIOUK ANDREI IVANOVICH, DAVIS MATTHEW F
Year of Publication 13.10.2009

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Extended chamber liner for improved mean time between cleanings of process chambers

by NGUYEN HOAN HAI, WILLWERTH MICHAEL D
Year of Publication 28.09.2011

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Showerhead assembly with improved impact protection

by PALAGASHVILI, DAVID, ERENSTEIN, ALEX, WILLWERTH, MICHAEL D
Year of Publication 16.09.2011

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GAS FLOW EQUALIZER PLATE SUITABLE FOR USE IN A SUBSTRATE PROCESS CHAMBER

by TODOROW VALENTIN N, BALAKRISHNA AJIT, WILLWERTH MICHAEL D, RAUF SHAHID, NGUYEN ANDREW
Year of Publication 03.09.2009

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GAS FLOW EQUALIZER PLATE SUITABLE FOR USE IN A SUBSTRATE PROCESS CHAMBER

by BALAKRISHNA, AJIT, RAUF, SHAHID, NGUYEN, ANDREW, TODOROW, VALENTIN D, WILLWERTH, MICHAEL D
Year of Publication 03.09.2009

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Low sloped edge ring for plasma processing chamber

by LEE CHANGHUN, WILLWERTH MICHAEL D, NGUYEN HOAN
Year of Publication 10.08.2011

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METHOD AND APPARATUS FOR STABLE PLASMA PROCESSING

by TODOROW VALENTIN N, WILLWERTH MICHAEL D, HOLLAND JOHN P
Year of Publication 18.05.2006

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Cover ring for use in a plasma processing chamber

by LEE, CHANG-HUN, NGUYEN, HOAN, WILLWERTH, MICHAEL D
Year of Publication 01.10.2013

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Shielded lid heater assembly

by TODOROW VALENTIN N, YUEN STEPHEN, PALAGASHVILI DAVID, WILLWERTH MICHAEL D
Year of Publication 25.09.2013

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CATHODE LINER ADAPTED FOR INJECTING GAS AT WAFER EDGE IN PLASMA REACTOR CHAMBER

by TODOROW VALENTIN N, PATERSON ALEXANDER M, PALAGASHVILI DAVID, WILLWERTH MICHAEL D, KATZ DAN
Year of Publication 26.03.2009

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High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck

by Todorov, Valentin N, Willwerth, Michael D, Paterson, Alexander, Hatcher, Brian K, Sammons, III, James E, Holland, John P
Year of Publication 17.08.2010

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High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck

by WILLWERTH MICHAEL D, SAMMONS, III JAMES E, PATERSON ALEXANDER, TODOROV VALENTIN N, HOLLAND JOHN P, HATCHER BRIAN K
Year of Publication 17.08.2010

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Method and apparatus for stable plasma processing

by TODOROW VALENTIN N, WILLWERTH MICHAEL D, HOLLAND JOHN P
Year of Publication 05.01.2006

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Method and apparatus for stable plasma processing

by TODOROW VALENTIN N.,HOLLAND JOHN P.,WILLWERTH MICHAEL D
Year of Publication 04.01.2006

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CATHODE LINER WITH WAFER EDGE GAS INJECTION IN A PLASMA REACTOR CHAMBER

by TODOROW VALENTIN N, PATERSON ALEXANDER M, PALAGASHVILI DAVID, WILLWERTH MICHAEL D, KATZ DAN
Year of Publication 10.03.2009

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Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

by TODOROW VALENTIN N, PATERSON ALEXANDER M, PALAGASHVILI DAVID, WILLWERTH MICHAEL D, KATZ DAN
Year of Publication 05.03.2009

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Cathode liner with wafer edge gas injection in a plasma reactor chamber

by TODOROW VALENTIN N, PATERSON ALEXANDER M, PALAGASHVILI DAVID, WILLWERTH MICHAEL D, KATZ DAN
Year of Publication 05.03.2009

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