Search Results - "WILLKOMMEN UDO" :: K.UTB vyhledávací portál

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Method and device for producing a low-emissivity layer system

by Willkommen Udo, Gross Harald
Year of Publication 27.09.2016

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METHOD AND DEVICE FOR PRODUCING A LOW-EMISSIVITY LAYER SYSTEM

by GROSS HARALD, WILLKOMMEN UDO
Year of Publication 17.07.2014

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METHOD AND DEVICE FOR PRODUCING A LOW-EMITTING LAYER SYSTEM

by GROSS, HARALD, WILLKOMMEN, UDO
Year of Publication 25.06.2014

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Substrate holder for gas diffusion furnaces, comprises guiding devices such as cross beams for the positioning and guidance of the substrate holder in the interior of the gas diffusion furnace, and substrate recesses

by KOECKERT, CHRISTOPH, WILLKOMMEN, UDO
Year of Publication 25.06.2009

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Method and device for producing low-emitting layer system

by GROSS HARALD, WILLKOMMEN UDO
Year of Publication 13.08.2014

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VORRICHTUNG UND VERFAHREN ZUR ZERSTÄUBUNG MIT EINEM BEWEGBAREN PLANAREN TARGET

by HAUSWALD, RALF, FUKAREK, WOLFGANG, WILLKOMMEN, UDO
Year of Publication 15.02.2011

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DEVICE AND METHOD FOR SPUTTERING WITH THE AID OF A DISPLACEABLE PLANAR TARGET

by HAUSWALD, RALF, FUKAREK, WOLFGANG, WILLKOMMEN, UDO
Year of Publication 09.02.2011

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METHOD AND DEVICE FOR PRODUCING A LOW-EMITTING LAYER SYSTEM

by GROSS, HARALD, WILLKOMMEN, UDO
Year of Publication 28.02.2013

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Verfahren und Vorrichtung zur Herstellung eines niedrigemittierenden Schichtsystems

by GROSS, HARALD, WILLKOMMEN, UDO
Year of Publication 21.02.2013

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Vorrichtung zum Ausrichten eines Substrates und einer Maske

by Willkommen, Udo, Gross, Harald, Zschieschang, Erwin
Year of Publication 27.10.2016

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GASDIFFUSIEWERKWIJZE EN DIFFUSIEOVEN VOOR HET UITVOEREN VAN DE WERKWIJZE

by KOECKERT, CHRISTOPH, HECHT, HANSRISTIAN, WILLKOMMEN, UDO
Year of Publication 18.05.2010

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VORRICHTUNG ZUM BEHANDELN VON SUBSTRATEN

by FUKAREK, WOLFGANG, HAUSWALD, RALF, WILLKOMMEN, UDO
Year of Publication 15.02.2010

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Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems

by Willkommen, Udo, Dipl.-Ing, Gross, Harald, Dr
Year of Publication 02.06.2016

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Substrates heat treatment apparatus

by FUKAREK, WOLFGANG, HAUSWALD, RALF, WILLKOMMEN, UDO
Year of Publication 27.01.2010

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Substrathalterung für Gasdiffusionsöfen

by KOECKERT, CHRISTOPH, WILLKOMMEN, UDO
Year of Publication 01.03.2012

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Diffusion furnace with reaction chamber for treating substrates, comprises first unit for generating a gas flow, and second- and funnel-shaped third unit for influencing the flow, where first and second units are arranged in the chamber

by KOECKERT, CHRISTOPH, DUTKOWIAK, ANDREAS, WILLKOMMEN, UDO
Year of Publication 04.06.2009

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Diffusion oven for manufacturing semiconductors, comprises a reaction chamber, which is surrounded by reaction tubes, an outer sheath, which surrounds the reaction chamber, heating elements, and means for producing vacuum

by KOECKERT, CHRISTOPH, HECHT, HANSRISTIAN, WILLKOMMEN, UDO
Year of Publication 30.04.2009

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Gasdiffusiewerkwijze en diffusieoven voor het uitvoeren van de werkwijze

by UDO WILLKOMMEN, CHRISTOPH KOECKERT, HANSRISTIAN HECHT
Year of Publication 28.04.2009

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DIFFUSIE-OVEN EN WERKWIJZE VOOR DE TEMPERATUURGELEIDING

by GREGOR, SABINE, KAECKERT, CHRISTOPH, ALBERTS, VIVIAN, HECHT, HANSRISTIAN, WILLKOMMEN, UDO
Year of Publication 21.03.2011

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DIFFUSIE-OVEN EN WERKWIJZE VOOR DE TEMPERATUURGELEIDING

by GREGOR, SABINE, KOECKERT, CHRISTOPH, ALBERTS, VIVIAN, HECHT, HANSRISTIAN, WILLKOMMEN, UDO
Year of Publication 08.09.2010

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