Semiconductor structure manufacturing method especially for deep trench memory circuits made with sub-100 nm technology, whereby doped silicon is deposited over the trench structure using on over-conforming separation method
HAUPT, MORITZ, STORBECK, OLAF, FOERSTER, MATTHIAS, STADTMUELLER, MICHAEL, KEGEL, WILHELM, DIETEL, ANDREAS, GEIDL, JOCHEN
Year of Publication 08.09.2005
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Year of Publication 08.09.2005
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Device and method for thermally treating semiconductor wafers
Roters, Georg, Frigge, Steffen, Tay, Sing Pin, Hu, Yao Zhi, Hayn, Regina, Sachse, Jens-Uwe, Schoer, Erwin, Kegel, Wilhelm
Year of Publication 19.12.2006
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Year of Publication 19.12.2006
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Plasma treatment device for treating e.g. semiconductor substrate, has electrodes arranged in pairs with same distance from center plane of chamber such that microwaves of electrodes are partially offset with respect to each other
NIES, JUERGEN, LERCH, WILFRIED, ROEVER, KAI-SVEN, GSCHWANDTNER, ALEXANDER, KEGEL, WILHELM, ROHLFING, FRANZISKA
Year of Publication 31.10.2012
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Year of Publication 31.10.2012
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Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates
STADTMUELLER MICHAEL, SCHOER ERWIN, KEGEL WILHELM, ROTERS GEORG, FRIGGE STEFFEN, SACHSE JENS-UWE, HAYN REGINA, STORBECK OLAF
Year of Publication 22.08.2006
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Year of Publication 22.08.2006
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Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates
Storbeck, Olaf, Kegel, Wilhelm, Sachse, Jens-Uwe, Stadtmüller, Michael, Hayn, Regina, Schoer, Erwin, Roters, Georg, Frigge, Steffen
Year of Publication 22.08.2006
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Year of Publication 22.08.2006
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Device and method for thermally treating semiconductor wafers
SCHOER ERWIN, ROTERS GEORG, KEGEL WILHELM, FRIGGE STEFFEN, SACHSE JENS-UWE, HAYN REGINA, HU YAO ZHI, TAY SING PIN
Year of Publication 19.12.2006
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Year of Publication 19.12.2006
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Method to increase the capacity in a memory-trench and memory-capacitor with increased capacity
RUF, ALEXANDER DR, KARCHER, WOLFRAM, KEGEL, WILHELM, SCHREMS, MARTIN DR
Year of Publication 21.06.2002
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Year of Publication 21.06.2002
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Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates
SCHOER ERWIN, KEGEL WILHELM, ROTERS GEORG, FRIGGE STEFFEN, SACHSE JENS-UWE, HAYN REGINA, STORBECK OLAF, STADTMULLER MICHAEL
Year of Publication 24.06.2004
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Year of Publication 24.06.2004
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Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates
Storbeck, Olaf, Kegel, Wilhelm, Sachse, Jens-Uwe, Stadtmuller, Michael, Hayn, Regina, Schoer, Erwin, Roters, Georg, Frigge, Steffen
Year of Publication 24.06.2004
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Year of Publication 24.06.2004
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Device and method for thermally treating semiconductor wafers
SCHOER ERWIN, ROTERS GEORG, KEGEL WILHELM, FRIGGE STEFFEN, TAY SING P, SACHSE JENS-UWE, HAYN REGINA, ZHI HU YAO
Year of Publication 18.05.2006
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Year of Publication 18.05.2006
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