Highly reliable silicon nitride thin films made by jet vapor deposition
WIE-WEN WANG, TSO-PING MA, GUANG-JI CUI, TAMAGAWA, T, GOLZ, J. W, KARECHI, S, HALPERN, B. H, SCHMITT, J. J
Published in Japanese Journal of Applied Physics (01.02.1995)
Published in Japanese Journal of Applied Physics (01.02.1995)
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