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"WIDMANN, DIETRICH"
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"WIDMANN, DIETRICH"
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FIELD EFFECT-CONTROLLED TRANSISTOR AND METHOD FOR PRODUCING THE SAME
by
WIDMANN
,
DIETRICH
,
WIEDER, ARMIN
Year of Publication
14.01.2009
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Method for producing a semiconductor memory device with a multiplicity of memory cells
by
TEMPEL GEORG
,
WIDMANN DIETRICH
Year of Publication
22.10.2002
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Method for producing a semiconductor memory device with a multiplicity of memory cells
by
Widmann
,
Dietrich
,
Tempel, Georg
Year of Publication
22.10.2002
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CMOS circuit with all-around dielectrically insulated source-drain regions
by
Widmann
,
Dietrich
,
Kerber, Martin
Year of Publication
11.06.2002
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CMOS circuit with all-around dielectrically insulated source-drain regions
by
KERBER MARTIN
,
WIDMANN DIETRICH
Year of Publication
11.06.2002
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Feldeffektgesteuerter Transistor und Verfahren zu dessen Herstellung
by
WIDMANN
,
DIETRICH
,
WIEDER, ARMIN
Year of Publication
11.04.2002
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FIELD EFFECT-CONTROLLED TRANSISTOR AND METHOD FOR PRODUCING THE SAME
by
WIDMANN
,
DIETRICH
,
WIEDER, ARMIN
Year of Publication
04.10.2001
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Method for producing a semiconductor memory device
by
TEMPEL GEORG
,
WIDMANN DIETRICH
Year of Publication
09.08.2001
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Method for producing a semiconductor memory device
by
Widmann
,
Dietrich
,
Tempel, Georg
Year of Publication
09.08.2001
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Method for producing a capacitor
by
TEMPEL GEORG
,
WIDMANN DIETRICH
Year of Publication
15.05.2001
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Method to produce integrated MOS-circuits
by
WIDMANN
,
DIETRICH
,
KERBER, MARTIN
Year of Publication
11.12.2000
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Process for manufacturing a CMOS circuit with all-around dielectrically insulated source-drain regions
by
WIDMANN
;
DIETRICH
,
KERBER; MARTIN
Year of Publication
26.09.2000
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METHOD FOR MANUFACTURE OF INTEGRATED SEMICONDUCTOR CIRCUITS, IN PARTICULAR CCD-CIRCUITS, WITH SELF- ADJUSTING NONOVERLAPPING POLYSILICON ELECTRODES
by
WIDMANN
,
DIETRICH
Year of Publication
13.03.1984
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METHOD FOR MANUFACTURE OF INTEGRATED SEMICONDUCTOR CIRCUITS, IN PARTICULAR CCD-CIRCUITS, WITH SELF-ADJUSTING, NONOVERLAPPING POLYSILICON ELECTRODES
by
WIDMANN
,
DIETRICH
Year of Publication
03.01.1984
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METHOD OF MAKING INTEGRATED SEMICONDUCTOR CIRCUITS, PARTICULARLY CCD CIRCUITS WITH SELF-ALIGNED, NON-OVERLAPPING POLYSILICON ELECTRODES
by
WIDMANN
,
DIETRICH
Year of Publication
31.08.1983
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METHOD OF MAKING INTEGRATED SEMICONDUCTOR CIRCUITS, PARTICULARLY CCD CIRCUITS, WITH SELF-ALIGNED, NON-OVERLAPPING POLYSILICON ELECTRODES
by
WIDMANN
,
DIETRICH
Year of Publication
24.08.1983
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CMOS-Schaltung mit teilweise dielektrisch isolierten Source-Drain-Bereichen und Verfahren zu ihrer Herstellung
by
WIDMANN
,
DIETRICH
,
KERBER, MARTIN
Year of Publication
21.10.1999
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Method of producing low-resistance diffused regions in IC MOS semiconductor circuits in silicon-gate technology metal silicide layer formation
by
WIDMANN
;
DIETRICH
Year of Publication
02.11.1982
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Method for manufacture of integrated semiconductor circuits, in particular CCD-circuits, with self-adjusting, nonoverlapping polysilicon electrodes
by
WIDMANN
;
DIETRICH
Year of Publication
05.10.1982
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Method for manufacture of integrated semiconductor circuits, in particular CCD-circuits, with self-adjusting, nonoverlapping polysilicon electrodes
by
WIDMANN
;
DIETRICH
Year of Publication
28.09.1982
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