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"WESTENDORP, JOHANNES F. M"
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"WESTENDORP, JOHANNES F. M"
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CVD OF INTEGRATED Ta AND TaNx FILMS FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
24.12.2008
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CVD of tantalum and tantalum nitride films from tantalum halide precursors
by
HAUTALA JOHN J
,
WESTENDORP JOHANNES F
.
M
Year of Publication
31.05.2005
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CVD of tantalum and tantalum nitride films from tantalum halide precursors
by
Hautala, John J
,
Westendorp
,
Johannes F
.
M
Year of Publication
31.05.2005
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Plasma treated thermal CVD of TaN films from tantalum halide precursors
by
WESTENDORP
,
JOHANNES F
.
M
,
HAUTALA, JOHN J
Year of Publication
21.06.2004
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CVD TaN plug formation from tantalum halide precursors
by
WESTENDORP
,
JOHANNES F
.
M
,
HAUTALA, JOHN J
Year of Publication
21.06.2004
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PECVD OF TAN FILMS FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
20.08.2003
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PLASMA TREATMENT OF THERMAL CVD TAN FILMS FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
13.08.2003
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PECVD of Ta films from tanatalum halide precursors
by
HAUTALA JOHN J
,
WESTENDORP JOHANNES F
.
M
Year of Publication
02.07.2002
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PECVD of Ta films from tanatalum halide precursors
by
Hautala, John J
,
Westendorp
,
Johannes F
.
M
Year of Publication
02.07.2002
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CVD of integrated Ta and TaNx films from tantalum halide precursors
by
HAUTALA JOHN J
,
WESTENDORP JOHANNES F
.
M
Year of Publication
25.06.2002
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Thermal CVD of TaN films from tantalum halide precursors
by
Hautala, John J
,
Westendorp
,
Johannes F
.
M
Year of Publication
25.06.2002
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Thermal CVD of TaN films from tantalum halide precursors
by
HAUTALA JOHN J
,
WESTENDORP JOHANNES F
.
M
Year of Publication
25.06.2002
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CVD of integrated Ta and TaNx films from tantalum halide precursors
by
Hautala, John J
,
Westendorp
,
Johannes F
.
M
Year of Publication
25.06.2002
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CVD of integrated Ta and TaNx films from tantalum halide precursors
by
WESTENDORP
,
JOHANNES F
.
M
,
HAUTALA, JOHN J
Year of Publication
21.04.2002
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CVD OF INTEGRATED Ta AND TaNx FILMS FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
03.04.2002
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PLASMA TREATMENT OF THERMAL CVD TAN FILMS FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
03.04.2002
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CVD TANTALUM NITRIDE PLUG FORMATION FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
14.03.2002
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PECVD OF TAN FILMS FROM TANTALUM HALIDE PRECURSORS
by
HAUTALA, JOHN, J
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
13.03.2002
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METHOD FOR ETCH RATE ENHANCEMENT BY BACKGROUND OXYGEN CONTROL IN A SOFT ETCH SYSTEM
by
GOLOVATO, STEPHEN, N
,
WESTENDORP
,
JOHANNES
,
F
.,
M
Year of Publication
27.09.2001
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Method for etch rate enhancement by background oxygen control in a soft etch system
by
WESTENDORP
,
JOHANNES F
.
M
,
GOLOVATO, STEPHEN N
Year of Publication
01.09.2001
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