Simulation of Applications of High-Transmittance Embedded Layer in Transmittance Control Mask and Optimization of Attenuated Phase-Shifting Mask by Design of Experiment
Yeh, Kwei-tin, Lin, Hsien-yun, Loong, Wen-an
Published in Japanese Journal of Applied Physics (01.01.2007)
Published in Japanese Journal of Applied Physics (01.01.2007)
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Journal Article
Modified Reflectance–Transmittance Method for the Metrology of Thin Film Optical Properties
Yeh, Kwei-tin, Lin, Chih-hung, Hu, Ji-ren, Loong, Wen-an
Published in Japanese Journal of Applied Physics (01.03.2006)
Published in Japanese Journal of Applied Physics (01.03.2006)
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Journal Article
AlSixOy AS A HIGH-TRANSMITTANCE EMBEDDED MATERIAL OF TERNARY ATTENUATED PHASE-SHIFTING MASK AND CORRELATION BETWEEN CHEMICAL COMPOSITION AND OPTICAL PROPERTIES OF AlSixOy IN 193 nm LITHOGRAPHY
Lin, C-M, Loong, W-A
Published in Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 12B, pp. 6801-6806. 2000 (2000)
Published in Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 12B, pp. 6801-6806. 2000 (2000)
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Journal Article
Image reversal of diazo-novolak resist by concurrent bake promoted and photoacid catalyzed esterifications
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Journal Article
Conference Proceeding
TiNx as a new embedded material for attenuated phase shift mask
Loong, Wen-an, Chen, Tzu-ching, Tseng, Jin-chi
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Journal Article
Conference Proceeding
Processes of top-imaged single-layer resists by potassium ion treatment in solution
Loong, Wen-an, Su, An-na, Wang, Jia-lian, Chu, Cheng-yu
Published in Microelectronic engineering (01.09.1991)
Published in Microelectronic engineering (01.09.1991)
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Journal Article
0.35 μm pattern fabrication using quartz-etch attenuate phase-shifting mask in an I-line stepper with a 0.50 NA and a 0.60 sigma
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Journal Article
Conference Proceeding
The simulation of application of high transmittance AttPSM for sub-100 nm pattern in 248 nm lithography
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Journal Article
Conference Proceeding
TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k
LOONG, W.-A, CHEN, C.-W, CHANG, Y.-H, LIN, C.-M, ZHENG CUI, LUNG, C.-A
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Conference Proceeding
Journal Article
Study on optimization of annular off-axis illumination using Taguchi method for 0.35 μm dense line/space
Loong, Wen-an, Tseng, Jin-chi, Chen, Tzu-ching, Lung, Chien-an
Published in Microelectronic engineering (01.02.1997)
Published in Microelectronic engineering (01.02.1997)
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Journal Article