Statistical Evaluation of Process Damage Using an Arrayed Test Pattern in a Large Number of MOSFETs
Watabe, Shunichi, Teramoto, Akinobu, Abe, Kenichi, Fujisawa, Takafumi, Miyamoto, Naoto, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in IEEE transactions on electron devices (01.06.2010)
Published in IEEE transactions on electron devices (01.06.2010)
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Journal Article
Large-Scale Test Circuits for High-Speed and Highly Accurate Evaluation of Variability and Noise in Metal--Oxide--Semiconductor Field-Effect Transistor Electrical Characteristics
Kumagai, Yuki, Abe, Kenichi, Fujisawa, Takafumi, Watabe, Shunichi, Kuroda, Rihito, Miyamoto, Naoto, Suwa, Tomoyuki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.10.2011)
Published in Japanese Journal of Applied Physics (01.10.2011)
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Journal Article
Experimental Investigation of Effect of Channel Doping Concentration on Random Telegraph Signal Noise
Abe, Kenichi, Teramoto, Akinobu, Watabe, Shunichi, Fujisawa, Takafumi, Sugawa, Shigetoshi, Kamata, Yutaka, Shibusawa, Katsuhiko, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2010)
Published in Japanese Journal of Applied Physics (01.04.2010)
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Journal Article
Large-Scale Test Circuits for High-Speed and Highly Accurate Evaluation of Variability and Noise in Metal–Oxide–Semiconductor Field-Effect Transistor Electrical Characteristics
Kumagai, Yuki, Abe, Kenichi, Fujisawa, Takafumi, Watabe, Shunichi, Kuroda, Rihito, Miyamoto, Naoto, Suwa, Tomoyuki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.10.2011)
Published in Japanese Journal of Applied Physics (01.10.2011)
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Journal Article
Asymmetry of RTS characteristics along source-drain direction and statistical analysis of process-induced RTS
Abe, K., Kumagai, Y., Sugawa, S., Watabe, S., Fujisawa, T., Teramoto, A., Ohmi, T.
Published in 2009 IEEE International Reliability Physics Symposium (01.01.2009)
Published in 2009 IEEE International Reliability Physics Symposium (01.01.2009)
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Conference Proceeding
A Test Circuit for Statistical Evaluation of [Formula Omitted] Junction Leakage Current and its Noise
Abe, Kenichi, Fujisawa, Takafumi, Suzuki, Hiroyoshi, Watabe, Shunichi, Kuroda, Rihito, Sugawa, Shigetoshi, Teramoto, Akinobu, Ohmi, Tadahiro
Published in IEEE transactions on semiconductor manufacturing (01.08.2012)
Published in IEEE transactions on semiconductor manufacturing (01.08.2012)
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Journal Article
Analysis of Hundreds of Time Constant Ratios and Amplitudes of Random Telegraph Signal with Very Large Scale Array Test Pattern
Fujisawa, Takafumi, Abe, Kenichi, Watabe, Shunichi, Miyamoto, Naoto, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2010)
Published in Japanese Journal of Applied Physics (01.04.2010)
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Journal Article
A Simple Test Structure for Evaluating the Variability in Key Characteristics of a Large Number of MOSFETs : International Conference on Microelectronic Test Structures
WATABE, Shunichi, TERAMOTO, Akinobu, ABE, Kenichi, FUJISAWA, Takafumi, MIYAMOTO, Naoto, SUGAWA, Shigetoshi, OHMI, Tadahiro
Published in IEEE transactions on semiconductor manufacturing (2012)
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Published in IEEE transactions on semiconductor manufacturing (2012)
Journal Article
Anomalous Random Telegraph Signal Extractions from a Very Large Number of n-Metal Oxide Semiconductor Field-Effect Transistors Using Test Element Groups with 0.47 Hz–3.0 MHz Sampling Frequency
Abe, Kenichi, Fujisawa, Takafumi, Teramoto, Akinobu, Watabe, Shunichi, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2009)
Published in Japanese Journal of Applied Physics (01.04.2009)
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Journal Article