Search Results - "WAKIYA, Kazumasa" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

기판의 처리 방법, 약액 및 약액의 제공 방법

기판의 처리 방법, 약액 및 약액의 제공 방법

by WADA YUKIHISA, NAMIKI TAKUMI, WAKIYA KAZUMASA
Year of Publication 09.04.2024

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Patent

METHOD FOR PROCESSING SUBSTRATE, CHEMICAL SOLUTION, AND METHOD FOR PROVIDING CHEMICAL SOLUTION

METHOD FOR PROCESSING SUBSTRATE, CHEMICAL SOLUTION, AND METHOD FOR PROVIDING CHEMICAL SOLUTION

by NAMIKI Takumi, WAKIYA Kazumasa, WADA Yukihisa
Year of Publication 06.04.2023

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Patent

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

by KOSHIYAMA JUN, WAKIYA KAZUMASA
Year of Publication 26.07.2019

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Patent

RINSE SOLUTION, SUBSTRATE PROCESSING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

RINSE SOLUTION, SUBSTRATE PROCESSING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

by WADA YUKIHISA, HARAGUCHI TAKAYUKI, FUJIMURA SATOSHI, OKAWA NATSUMI, WAKIYA KAZUMASA
Year of Publication 30.08.2023

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Patent

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

by KOSHIYAMA JUN, WAKIYA KAZUMASA
Year of Publication 24.08.2018

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Patent

RINSING SOLUTION METHOD OF TREATING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

RINSING SOLUTION METHOD OF TREATING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

by WADA YUKIHISA, HARAGUCHI TAKAYUKI, FUJIMURA SATOSHI, OKAWA NATSUMI, WAKIYA KAZUMASA
Year of Publication 25.08.2023

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Patent

CLEANING LIQUID, AND METHOD FOR CLEANING SUBSTRATE

CLEANING LIQUID, AND METHOD FOR CLEANING SUBSTRATE

by SERIZAWA KOHEI, GO CHOITSU, WADA YUKIHISA, WAKIYA KAZUMASA
Year of Publication 10.07.2023

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Patent

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

by SERIZAWA KOHEI, GO CHOITSU, WADA YUKIHISA, WAKIYA KAZUMASA
Year of Publication 05.07.2023

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Patent

HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE

HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE

by KINOSHITA, Yohei, INARI, Takatoshi, NODA, Kunihiro, NISHIZAWA, Akito, KIMURA, Kenta, KUBO, Keisuke, WAKIYA, Kazumasa
Year of Publication 06.09.2024

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Patent

HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF COMPOUND AND SOLVATE THEREOF, AND METHOD FOR PRODUCING COMPOUND, SOLVATE THEREOF, OR MIXTURE OF COMPOUND AND SOLVATE THEREOF

HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF COMPOUND AND SOLVATE THEREOF, AND METHOD FOR PRODUCING COMPOUND, SOLVATE THEREOF, OR MIXTURE OF COMPOUND AND SOLVATE THEREOF

by KINOSHITA, Yohei, INARI, Takatoshi, NODA, Kunihiro, NISHIZAWA, Akito, KIMURA, Kenta, KUBO, Keisuke, WAKIYA, Kazumasa
Year of Publication 06.09.2024

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Patent

ISOPOLYOXOTUNGSTATE SALT COMPOUND, SOLVATE THEREOF OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE OR MIXTURE

ISOPOLYOXOTUNGSTATE SALT COMPOUND, SOLVATE THEREOF OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE OR MIXTURE

by KINOSHITA, Yohei, INARI, Takatoshi, UNO, Kakishi, NODA, Kunihiro, NISHIZAWA, Akito, KIMURA, Kenta, KUBO, Keisuke, WAKIYA, Kazumasa
Year of Publication 20.06.2024

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Patent

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

by KOSHIYAMA JUN, WAKIYA KAZUMASA
Year of Publication 11.08.2017

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Patent

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD HYDROPHOBILIZATION METHOD AND HYDROPHOBILIZED SUBSTRATE

by KOSHIYAMA JUN, WAKIYA KAZUMASA
Year of Publication 05.10.2016

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Patent

CLEANING LIQUID, AND METHOD FOR CLEANING SUBSTRATE

CLEANING LIQUID, AND METHOD FOR CLEANING SUBSTRATE

by SERIZAWA KOHEI, KONDO JUN, GO CHOITSU, WADA YUKIHISA, WAKIYA KAZUMASA
Year of Publication 10.07.2023

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Patent

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

by SERIZAWA KOHEI, KONDO JUN, GO CHOITSU, WADA YUKIHISA, WAKIYA KAZUMASA
Year of Publication 05.07.2023

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Patent

세정 조성물, 세정 방법, 및 반도체의 제조 방법

세정 조성물, 세정 방법, 및 반도체의 제조 방법

by TOSHIMA TAKAYUKI, TERADA SHOICHI, NAKAMURA JUNJI, HIRANO ISAO, WAKIYA KAZUMASA
Year of Publication 04.06.2019

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Patent

CLEANING COMPOSITION, CLEANING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR

CLEANING COMPOSITION, CLEANING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR

by TERADA Shoichi, HIRANO Isao, TOSHIMA Takayuki, WAKIYA Kazumasa, NAKAMURA Junji
Year of Publication 05.04.2018

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Patent

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE

by KOSHIYAMA JUN, WAKIYA KAZUMASA
Year of Publication 27.07.2011

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Patent

IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHOD FOR FORMING RESIST PATTERN USING SUCH IMMERSION LIQUID

IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHOD FOR FORMING RESIST PATTERN USING SUCH IMMERSION LIQUID

by WAKIYA, KAZUMASA
Year of Publication 16.03.2006

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Patent

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE

by WAKIYA, KAZUMASA, KOSHIYAMA, JUN
Year of Publication 29.04.2010

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Patent

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