Search Results - "WAKAYAMA HIROYUKI" :: K.UTB vyhledávací portál

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MOBILE TERMINAL AND RESTRICTION METHOD OF APPLICATION USAGE OF THE SAME

by WAKAYAMA HIROYUKI
Year of Publication 21.05.2020

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산촉매 담지형 폴리머를 포함하는 레지스트 하층막 형성 조성물

by SHIMIZU SHOU, WAKAYAMA HIROYUKI, TAMURA MAMORU
Year of Publication 17.11.2023

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Patent

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RESIST UNDERLAYER FILM-FORMING COMPOSITION THAT INCLUDES ACID CATALYST-SUPPORTING POLYMER

by SHIMIZU Shou, WAKAYAMA Hiroyuki, TAMURA Mamoru
Year of Publication 22.09.2022

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SEAT SLIDE LOCK DEVICE FOR VEHICLE

by WAKAYAMA HIROYUKI
Year of Publication 24.08.2015

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Patent

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보호된 염기성의 유기기를 갖는 레지스트 하층막 형성 조성물

by SHIMIZU SHOU, WAKAYAMA HIROYUKI, IGATA KOSUKE, TAMURA MAMORU
Year of Publication 23.11.2023

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RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COMPOUND-TERMINATED POLYMER

by MIZUOCHI RYUTA, WAKAYAMA HIROYUKI, SHIMIZU SHO, SOMEYA YASUNOBU
Year of Publication 12.09.2023

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RESIST UNDERLAYER FILM FORMING COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME

by MIZUOCHI RYUTA, WAKAYAMA HIROYUKI, SHIMIZU SHO, SOMEYA YASUNOBU
Year of Publication 19.07.2023

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수직 상분리한 블록 코폴리머층

by MIZUOCHI RYUTA, NAKAJIMA MAKOTO, WAKAYAMA HIROYUKI, SAKAMOTO RIKIMARU, TAMURA MAMORU
Year of Publication 18.04.2023

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EUV레지스트 하층막 형성 조성물

by MIZUOCHI RYUTA, SHIMIZU SHOU, WAKAYAMA HIROYUKI, TAMURA MAMORU
Year of Publication 12.10.2022

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RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING PROTECTED BASIC ORGANIC GROUP

by IGATA Kosuke, SHIMIZU Shou, WAKAYAMA Hiroyuki, TAMURA Mamoru
Year of Publication 29.09.2022

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SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION FOR SOLVENT DEVELOPMENT

by NAKAJIMA MAKOTO, TAKEDA SATOSHI, WAKAYAMA HIROYUKI, KANNO YUTA
Year of Publication 07.03.2022

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VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER

by SAKAMOTO Rikimaru, MIZUOCHI Ryuta, WAKAYAMA Hiroyuki, TAMURA Mamoru, NAKAJIMA Makoto
Year of Publication 24.02.2022

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지환식 화합물 말단의 중합체를 포함하는 레지스트 하층막형성 조성물

by MIZUOCHI RYUTA, SHIMIZU SHOU, WAKAYAMA HIROYUKI, SOMEYA YASUNOBU
Year of Publication 18.01.2022

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COMPOSITION FOR FORMING EUV RESIST UNDERLAYER FILM

by SHIMIZU Shou, MIZUOCHI Ryuta, WAKAYAMA Hiroyuki, TAMURA Mamoru
Year of Publication 05.08.2021

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Patent

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레지스트 하층막 형성 조성물 및 그것을 이용한 레지스트패턴의 형성방법

by MIZUOCHI RYUTA, SHIMIZU SHOU, WAKAYAMA HIROYUKI, SOMEYA YASUNOBU
Year of Publication 16.06.2021

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미세 상분리패턴 형성을 위한 블록코폴리머층 형성 조성물

by MIZUOCHI RYUTA, TADOKORO SHINSUKE, WAKAYAMA HIROYUKI, KOZAWA MASAMI, SOMEYA YASUNOBU
Year of Publication 24.03.2021

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RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING ALICYCLIC COMPOUND-TERMINATED POLYMER

by SHIMIZU Shou, MIZUOCHI Ryuta, WAKAYAMA Hiroyuki, SOMEYA Yasunobu
Year of Publication 12.11.2020

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Patent

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BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND

by ENDO TAKAFUMI, WAKAYAMA HIROYUKI, SAKAMOTO RIKIMARU, SOMEYA YASUNOBU
Year of Publication 14.09.2020

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RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME

by SHIMIZU Shou, MIZUOCHI Ryuta, WAKAYAMA Hiroyuki, SOMEYA Yasunobu
Year of Publication 09.04.2020

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COMPOSITION FOR FORMING RESIST UNDERLAYER INCLUDING SILICON AND HAVING ORGANIC GROUP CONTAINING ALIPHATIC POLYCYCLIC STRUCTURE

by SHIGAKI SHUHEI, NAKAJIMA MAKOTO, SHIBAYAMA WATARU, TAKEDA SATOSHI, WAKAYAMA HIROYUKI, SAKAMOTO RIKIMARU
Year of Publication 14.12.2021

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Patent

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