Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2
Nabesawa, Hirofumi, Hiruma, Takaharu, Hitobo, Takeshi, Wakabayashi, Suguru, Asaji, Toyohisa, Abe, Takashi, Seki, Minoru
Published in AIP advances (01.11.2013)
Published in AIP advances (01.11.2013)
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Journal Article
Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF{sub 4} and O{sub 2}
Nabesawa, Hirofumi, Central Research Institute, Toyama Industrial Technology Center, Takaoka, 933-0981, Hiruma, Takaharu, Seki, Minoru, Hitobo, Takeshi, Wakabayashi, Suguru, Asaji, Toyohisa, Electronic-Mechanical Engineering Department, Oshima National College of Maritime Technology, Suo-Oshima, 742-2193, Abe, Takashi
Published in AIP advances (15.11.2013)
Published in AIP advances (15.11.2013)
Get full text
Journal Article