Electron beam calibration method for character projection exposure system EX-8D
SUNAOSHI, H, HATTORI, K, HASHIMOTO, S, YOSHIKAWA, R, TAKIGAWA, T, TAKAMATSU, J, ANDO, A, WADA, H, MAGOSHI, S, YAMAGUCHI, T, SATO, S, NISHIMURA, S, HOUSAI, H
Published in Japanese Journal of Applied Physics (1995)
Published in Japanese Journal of Applied Physics (1995)
Get full text
Conference Proceeding
Journal Article
Evaluation of shaping gain adjustment accuracy using atomic force microscope in variably shaped electron-beam writing systems
NISHIMURA, S, SUNAOSHI, H, YAMASAKI, S, HATTORI, K, TAMAMUSHI, S, WADA, H, OGAWA, Y
Published in Japanese Journal of Applied Physics (01.12.1997)
Published in Japanese Journal of Applied Physics (01.12.1997)
Get full text
Conference Proceeding
Journal Article
Contamination charging up effect in a variably shaped electron beam writer
ANDO, A, SUNAOSHI, H, SATO, S, MAGOSHI, S, HATTORI, K, SUENAGA, M, WADA, H, HOUSAI, H, HASHIMOTO, S, SUGIHARA, K
Published in Japanese Journal of Applied Physics (1996)
Published in Japanese Journal of Applied Physics (1996)
Get full text
Conference Proceeding
Journal Article
Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation
Hattori, Kiyoshi, Ikenaga, Osamu, Tamamushi, Syuichi, Wada, Hirotsugu, Nishimura, Eiji, Ikeda, Naotaka, Katoh, Yoshihide, Kusakabe, Hideo, Yoshikawa, Ryoichi, Takigawa, Tadahiro
Published in Japanese Journal of Applied Physics (01.10.1989)
Published in Japanese Journal of Applied Physics (01.10.1989)
Get full text
Journal Article
Patterning accuracy estimation of electron beam direct-writing system EX-8D
HATTORI, K, MAGOSHI, S, YOSHIKAWA, R, TAKIGAWA, T, SUNAOSHI, H, WADA, H, ANDO, A, YAMAGUCHI, T, MIKAMI, S, NISHIMURA, S, HOUSAI, H, HASHIMOTO, S
Published in Japanese Journal of Applied Physics (1994)
Published in Japanese Journal of Applied Physics (1994)
Get full text
Journal Article